Patents by Inventor lvo OTTO, IV

lvo OTTO, IV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SELECTIVE GAS PHASE ETCH OF SILICON GERMANIUM ALLOYS
    Publication number: 20240128088
    Abstract: Methods for selective etching of one layer or material relative to another layer or material adjacent thereto. In an example, a SiGe layer is etched relative to or selective to another silicon containing layer which either contains no germanium or geranium in an amount less than that of the target layer.
    Type: Application
    Filed: October 17, 2022
    Publication date: April 18, 2024
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Toshiki KANAKI, Subhadeep KAL, Aelan MOSDEN, lvo OTTO, IV, Masashi MATSUMOTO, Shinji IRIE