Abstract: Various embodiments illustrated herein disclose a full body harness that includes a connector. The connector includes a first plate and a second plate, where the first plate is identical to the second plate. The first plate and the second plate includes a plurality of slits to facilitate passage of a first harness and a second harness there through. The first plate is rotatably coupled to the second plate such that they are rotatable with respect to each other. Such a connector automatically enables easy adjustment of the harness based on an activity of a user who is wearing the harness.

Abstract: A low dielectric constant film containing a silicon, a carbon, an oxygen, and a hydrogen is formed on a substrate as a semiconductor wafer, and a resist film is formed on the low dielectric constant film. Then, the low dielectric constant film is etched with the use of the resist film as a mask to form an exposed surface of the low dielectric constant film. Next, there is deposited a protective film that covers the exposed surface of the low dielectric constant film formed by etching. Thereafter, by ashing with the use of a plasma containing an oxygen, the protective film and the resist film are removed. During the ashing, desorption of the carbon from an insulation film is restrained by the protective film.