Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.

Abstract: Methods and apparatus for concentrating light into a specified focal volume and for collecting light from a specified volume. Incident light is coupled through a plurality of successive transmissive asymmetric microstructure elements. The succession of transmissive asymmetric microstructure elements may be designed by representing an electromagnetic field as a linear combination of eigenmodes of one of the succession of transmissive asymmetric microstructure elements. The asymmetric microstructure elements are represented as a plurality of mesh lattice units and eigenmode solutions to Maxwell's equations are obtained for each mesh lattice unit subject to consistent boundary conditions. S-matrix formalism is employed to calculate a field output and weighting coefficients for the eigenmodes are selected to achieve a specified set of field output characteristics.

Abstract: Methods and apparatus for concentrating light into a specified focal volume and for collecting light from a specified volume. Incident light is coupled through a plurality of successive transmissive asymmetric microstructure elements. The succession of transmissive asymmetric microstructure elements may be designed by representing an electromagnetic field as a linear combination of eigenmodes of one of the succession of transmissive asymmetric microstructure elements. The asymmetric microstructure elements are represented as a plurality of mesh lattice units and eigenmode solutions to Maxwell's equations are obtained for each mesh lattice unit subject to consistent boundary conditions. S-matrix formalism is employed to calculate a field output and weighting coefficients for the eigenmodes are selected to achieve a specified set of field output characteristics.

Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.

Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.

Abstract: Configurations for in-situ gas detection are provided, and include miniaturized photonic devices, low-optical-loss, guided-wave structures and state-selective adsorption coatings. High quality factor semiconductor resonators have been demonstrated in different configurations, such as micro-disks, micro-rings, micro-toroids, and photonic crystals with the properties of very narrow NIR transmission bands and sensitivity up to 10?9 (change in complex refractive index). The devices are therefore highly sensitive to changes in optical properties to the device parameters and can be tunable to the absorption of the chemical species of interest. Appropriate coatings applied to the device enhance state-specific molecular detection.

Abstract: Configurations for in-situ gas detection are provided, and include miniaturized photonic devices, low-optical-loss, guided-wave structures and state-selective adsorption coatings. High quality factor semiconductor resonators have been demonstrated in different configurations, such as micro-disks, micro-rings, micro-toroids, and photonic crystals with the properties of very narrow NIR transmission bands and sensitivity up to 10?9 (change in complex refractive index). The devices are therefore highly sensitive to changes in optical properties to the device parameters and can be tunable to the absorption of the chemical species of interest. Appropriate coatings applied to the device enhance state-specific molecular detection.

Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.

Abstract: Methods and apparatus for method for characterizing a height profile of a scattering surface relative to a fiducial plane. The scattering surface, which may be an interface between distinct solid, liquid, gaseous or plasma phases, is illuminated with substantially spatially coherent light, and light scattered by the scattering surface is collected and dispersed, such as by a grating, into zeroth- and first-order beams. A spatial Fourier transform of the zeroth- and first-order beams is created, and one of the beams is low-pass filtered. The beams are interfered at a focal plane detector to generate an interferogram, which is transformed to retrieve a spatially resolved quantitative phase image and/or an amplitude image of the scattering surface. Imaging may be performed during an etching process, and may be used to adaptively control a photoetching process in a feedback loop.

Abstract: Configurations for in-situ gas detection are provided, and include miniaturized photonic devices, low-optical-loss, guided-wave structures and state-selective adsorption coatings. High quality factor semiconductor resonators have been demonstrated in different configurations, such as micro-disks, micro-rings, micro-toroids, and photonic crystals with the properties of very narrow NIR transmission bands and sensitivity up to 10?9 (change in complex refractive index). The devices are therefore highly sensitive to changes in optical properties to the device parameters and can be tunable to the absorption of the chemical species of interest. Appropriate coatings applied to the device enhance state-specific molecular detection.

Abstract: Compact tunable optical cavities are provided for in-situ NIR spectroscopy. MEMS-tunable VCSEL platforms represents a solid foundation for a new class of compact, sensitive and fiber compatible sensors for fieldable, real-time, multiplexed gas detection systems. Detection limits for gases with NIR cross-sections such as O2, CH4, COx and NOx have been predicted to approximately span from 10ths to 10s of parts per million. Exemplary oxygen detection design and a process for 760 nm continuously tunable VCSELS is provided. This technology enables in-situ self-calibrating platforms with adaptive monitoring by exploiting Photonic FPGAs.

Abstract: A system in one general embodiment includes a waveguide structure comprising a core of an alloy of Group III-V materials surrounded by an oxide (which may include one or more Group III-V metals), wherein an interface of the oxide and core is characterized by oxidation of the alloy for defining the core. A method in one general approach includes oxidizing a waveguide structure comprising an alloy of Group III-V materials for forming a core of the alloy surrounded by an oxide.

Abstract: Compact tunable optical cavities are provided for in-situ NIR spectroscopy. MEMS-tunable VCSEL platforms represents a solid foundation for a new class of compact, sensitive and fiber compatible sensors for fieldable, real-time, multiplexed gas detection systems. Detection limits for gases with NIR cross-sections such as O2, CH4, COx and NOx have been predicted to approximately span from 10ths to 10s of parts per million. Exemplary oxygen detection design and a process for 760 nm continuously tunable VCSELS is provided. This technology enables in-situ self-calibrating platforms with adaptive monitoring by exploiting Photonic FPGAs.

Abstract: A system in one general embodiment includes a waveguide structure comprising a core of an alloy of Group III-V materials surrounded by an oxide (which may include one or more Group III-V metals), wherein an interface of the oxide and core is characterized by oxidation of the alloy for defining the core. A method in one general approach includes oxidizing a waveguide structure comprising an alloy of Group III-V materials for forming a core of the alloy surrounded by an oxide.