Abstract: Social Prescription Identification Number (SPIN) is a unique national outpatient identification number to collectively and individually identify every pharmacy patient in one national interoperable super database. The super database will interface with America's interdependent, competitively fragmented retail pharmacy networks, tracking individual patient prescription transactions. SPIN will function as an insurance identification number offering comprehensive necessary real time prescription adjudication information from insurance providers. One national pharmacy identification number in its own national database, is an option offering U.S. government and/or American retail pharmacy, benefits of a national provider outpatient prescription service overlay of a diverse retail pharmacy network. Technological evolution, configuration change, and national pharmacy network diversity may not be conducive to cellular modules during patent formation.

Abstract: Social Prescription Identification Number (SPIN) is a unique national outpatient identification number to collectively and individually identify every pharmacy patient in one national interoperable super database. The super database will interface with America's interdependent, competitively fragmented retail pharmacy networks, tracking individual patient prescription transactions. SPIN will function as an insurance identification number offering comprehensive necessary real time prescription adjudication information from insurance providers. One national pharmacy identification number in its own national database, is an option offering U.S. government and/or American retail pharmacy, benefits of a national provider outpatient prescription service overlay of a diverse retail pharmacy network. Technological evolution, configuration change, and national pharmacy network diversity may not be conducive to cellular modules during patent formation.

Abstract: A stencil or scatterer mask for use with charged particle beam lithography such as projection electron-beam lithography comprises a membrane layer of a material having a Young's modulus of at least about 400 GPa and support struts supporting a surface of the membrane. The struts form and surrounding a plurality of discrete membrane areas of different aspect ratios aligned to design regions of an integrated circuit. The discrete membrane areas have different aspect ratios range from about 1:1 to about 12:1, and the discrete membrane areas have different size surface areas. The membrane is preferably silicon carbide, diamond, diamond-like carbon, amorphous carbon, carbon nitride or boron nitride. When used in scatterer masks, the ratio of discrete membrane area to membrane thickness is at least about 0.18 mm2/nm. When used in stencil masks, the ratio of discrete membrane area to membrane thickness is at least about 1.0 mm2/nm.