Abstract: The present invention relates to a semiconductor device having a capacitor and a method for fabricating the same. A semiconductor device may comprise: a lower electrode; a supporter supporting an outer wall of the lower electrode; a dielectric layer formed over the lower electrode and the supporter; an upper electrode formed on the dielectric layer; and a dielectric booster layer disposed between the lower electrode and the dielectric layer, and selectively formed on a surface of the lower electrode.

Abstract: The present invention relates to a semiconductor device having a capacitor and a method for fabricating the same. A semiconductor device may comprise: a lower electrode; a supporter supporting an outer wall of the lower electrode; a dielectric layer formed over the lower electrode and the supporter; an upper electrode formed on the dielectric layer; and a dielectric booster layer disposed between the lower electrode and the dielectric layer, and selectively formed on a surface of the lower electrode.

Abstract: A semiconductor device includes: a vertical conductive line; a horizontal layer oriented horizontally from the vertical conductive line; a horizontal conductive line crossing the horizontal layer; and a data storage element in contact with the horizontal layer, wherein the data storage element includes: a first electrode including a first cylinder that is in contact with an edge of an upper portion of the horizontal layer and a second cylinder that is in contact with an edge of a lower portion of the horizontal layer; a second electrode disposed over the first electrode; and a dielectric layer between the first electrode and the second electrode, and the second electrode includes: a sharing portion disposed in a gap between the first cylinder and the second cylinder; inner portions disposed on an inner surface of the first cylinder and an inner surface of the second cylinder; and outer portions disposed over the first cylinder and below the second cylinder.

Abstract: Provided are a method for manufacturing a single-crystal semiconductor layer. The method of manufacturing the single crystalline semiconductor layer includes performing a unit cycle multiple times, wherein the unit cycle includes a metal precursor pressurized dosing operation in which a metal precursor is adsorbed on a surface of a single crystalline substrate by supplying the metal precursor onto the single crystalline substrate while an outlet of a chamber in which the single crystalline substrate is loaded is closed such that a reaction pressure in the chamber is increased; a metal precursor purge operation; a reactive gas supplying operation in which a reactive gas is supplied into the chamber to cause a reaction of the reactive gas with the metal precursor adsorbed on the single crystalline substrate after the metal precursor purge operation; and a reactive gas purge operation.

Abstract: The present invention relates to a semiconductor device having a capacitor and a method for fabricating the same. A semiconductor device may comprise: a lower electrode; a supporter supporting an outer wall of the lower electrode; a dielectric layer formed over the lower electrode and the supporter; an upper electrode formed on the dielectric layer; and a dielectric booster layer disposed between the lower electrode and the dielectric layer, and selectively formed on a surface of the lower electrode.

Abstract: Provided are a method for manufacturing a single-crystal semiconductor layer. The method of manufacturing the single crystalline semiconductor layer includes performing a unit cycle multiple times, wherein the unit cycle includes a metal precursor pressurized dosing operation in which a metal precursor is adsorbed on a surface of a single crystalline substrate by supplying the metal precursor onto the single crystalline substrate while an outlet of a chamber in which the single crystalline substrate is loaded is closed such that a reaction pressure in the chamber is increased; a metal precursor purge operation; a reactive gas supplying operation in which a reactive gas is supplied into the chamber to cause a reaction of the reactive gas with the metal precursor adsorbed on the single crystalline substrate after the metal precursor purge operation; and a reactive gas purge operation.

Abstract: A barrier according to an embodiment of the present invention is provided. The barrier includes a polymer configured of a plurality of first atoms; and an inorganic material configured of a plurality of second atoms and coexisting with the organic material, wherein an atomic planar density defined by the number of atoms per cm2 of the first atoms and the second atoms exceeds 1.9×1017 atoms/cm2.

Abstract: A barrier according to an embodiment of the present invention is provided. The barrier includes a polymer configured of a plurality of first atoms; and an inorganic material configured of a plurality of second atoms and coexisting with the organic material, wherein an atomic planar density defined by the number of atoms per cm2 of the first atoms and the second atoms exceeds 1.9×1017 atoms/cm2.

Abstract: A method for manufacturing a perovskite crystal structure includes preparing a substrate, disposing a stamp having a roll shape on the substrate, injecting a perovskite precursor solution between the substrate and the stamp, and drying the precursor solution to manufacture a perovskite crystal structure. The stamp rolls in a first direction on the substrate, and the precursor solution is continuously crystallized in the first direction between the substrate and the stamp to manufacture the perovskite crystal structure.

Abstract: A method for manufacturing a perovskite crystal structure includes preparing a substrate, disposing a stamp having a roll shape on the substrate, injecting a perovskite precursor solution between the substrate and the stamp, and drying the precursor solution to manufacture a perovskite crystal structure. The stamp rolls in a first direction on the substrate, and the precursor solution is continuously crystallized in the first direction between the substrate and the stamp to manufacture the perovskite crystal structure.

Abstract: Method and apparatus for shift work scheduling based upon an optimization of analyzing and managing fatigue primarily in but not limited to aviation occupations. The invention matches workers to shifts in a manner that minimizes fatigue while on shift and maximizes shift worker effectiveness. The invention is adaptable to other occupations where assuring shift work crew rest is critical. Graphical user interfaces (GUIs) allow for the insertion of sleep into crew shift work schedules. Alternative sleep models are used for different modes of sleep. The invention produces as an output an optimized shift work/sleep schedules with an associated effectiveness determination.

Abstract: Method and apparatus for analyzing and managing fatigue primarily in but not limited to aviation occupations. The invention is adaptable to other occupations where assuring crew rest is critical. Graphical user interfaces (GUIs) allow for the insertion of sleep quantity, quality, and sleep interruptions over a number of days. The invention produces as an output the user's cognitive effectiveness ranging from high levels to critically low levels over a period of days.

Abstract: Method and apparatus for shift work scheduling based upon an optimization of analyzing and managing fatigue primarily in but not limited to aviation occupations. The invention matches workers to shifts in a manner that minimizes fatigue while on shift and maximizes shift worker effectiveness. The invention is adaptable to other occupations where assuring shift work crew rest is critical. Graphical user interfaces (GUIs) allow for the insertion of sleep into crew shift work schedules. Alternative sleep models are used for different modes of sleep. The invention produces as an output an optimized shift work/sleep schedules with an associated effectiveness determination.

Abstract: Apparatus and method for analyzing and managing fatigue primarily in aviation occupations. The invention is adaptable to other occupations where assuring crew rest is critical. Air crew specific graphical user interfaces (GUIs) allow for the insertion of sleep into crew work schedules. Alternative sleep models are used for different modes of sleep. The invention produces as an output work/sleep schedules with an associated effectiveness determination.

Abstract: Systems and methods are disclosed herein to provide improved techniques for connecting an electrical device to an external power source. For example, in accordance with an embodiment of the present invention, an electrical device is disclosed having various types of connections to a power source. The connections may also provide power transformation.