Patents by Inventor Lynn Ryle

Lynn Ryle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Brush box containment apparatus
    Patent number: 6272712
    Abstract: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: August 14, 2001
    Assignee: Lam Research Corporation
    Inventors: Thomas R. Gockel, Lorin Olson, Lynn Ryle, Brett A. Whitelaw, Michael Ravkin
  • Brush assembly apparatus
    Patent number: 6119295
    Abstract: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
    Type: Grant
    Filed: April 2, 1999
    Date of Patent: September 19, 2000
    Assignee: Lam Research Corporation
    Inventors: Thomas R. Gockel, Lorin Olson, Lynn Ryle, Brett A. Whitelaw
  • Method for processing a substrate using a system having a roller with treading
    Patent number: 6059889
    Abstract: A method for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.
    Type: Grant
    Filed: January 7, 1999
    Date of Patent: May 9, 2000
    Assignee: OnTrak Systems, Inc.
    Inventors: Alan J. Jensen, Norman A. Mertke, William Dyson, Jr., Lynn Ryle, Patrick Paino
  • Brush assembly apparatus
    Patent number: 5924154
    Abstract: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: July 20, 1999
    Assignee: Ontrak Systems, Inc.
    Inventors: Thomas R. Gockel, Lorin Olson, Lynn Ryle, Brett A. Whitelaw, Michael Ravkin
  • Roller with treading and system including the same
    Patent number: 5862560
    Abstract: A method and apparatus for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: January 26, 1999
    Assignee: Ontrak Systems, Inc.
    Inventors: Alan J. Jensen, Norman A. Mertke, William Dyson, Jr., Lynn Ryle, Patrick Paino
  • Roller positioning apparatus
    Patent number: 5809832
    Abstract: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: September 22, 1998
    Assignee: Ontrak Systems, Inc.
    Inventors: Thomas R. Gockel, Lorin Olson, Lynn Ryle, Brett A. Whitelaw
  • Containment apparatus
    Patent number: 5794299
    Abstract: A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: August 18, 1998
    Assignee: Ontrak Systems, Inc.
    Inventors: Thomas R. Gockel, Lorin Olson, Lynn Ryle, Brett A. Whitelaw
  • Automatically adjustable brush assembly for cleaning semiconductor wafers
    Patent number: 5475889
    Abstract: An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the arms of the brush carriage and configured for automatically adjusting the pressure applied to the wafer surfaces by the first and second rotary brushes. The brush assembly further includes a control system coupled to the pressure adjustment assembly for controlling operation of the pressure adjustment assembly to selectively increase and decrease the pressure applied to the wafer by the first and second rotary brushes.
    Type: Grant
    Filed: July 15, 1994
    Date of Patent: December 19, 1995
    Assignee: OnTrak Systems, Inc.
    Inventors: David L. Thrasher, Lynn Ryle