Abstract: A pluggable optical module may include a housing enclosing one or more optical components and one or more electrical components. The pluggable optical module may include a slider to move along an exterior wall of the housing in association with latching or unlatching the pluggable optical module. The pluggable optical module may include an electromagnetic interference (EMI) shield arranged in a gap between the slider and the exterior wall of the housing such that the EMI shield contacts the slider and the exterior wall of the housing. The EMI shield reduce EMI radiation passing through the gap.

Abstract: A pluggable optical module may include a housing enclosing one or more optical components and one or more electrical components. The pluggable optical module may include a slider to move along an exterior wall of the housing in association with latching or unlatching the pluggable optical module. The pluggable optical module may include an electromagnetic interference (EMI) shield arranged in a gap between the slider and the exterior wall of the housing such that the EMI shield contacts the slider and the exterior wall of the housing. The EMI shield reduce EMI radiation passing through the gap.

Abstract: Methods and apparatuses for pattern-based methodology for CAA and defect limited yield analysis are disclosed. Embodiments may include matching one or more patterns within a layer of an integrated circuit design layout to one or more pre-characterized patterns within a pattern library, determining respective critical areas of the one or more patterns based on respective pre-characterized critical areas of the one or more pre-characterized patterns, and predicting a defect limited yield of the layer based on the respective pre-characterized critical areas.

Abstract: A process and apparatus are provided for automated pattern-based semiconductor design layout correction. Embodiments include scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern, determining a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern, and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.

Abstract: Methodology enabling a reduction in a density difference between two complementary exposure masks and/or windows of a layout and an apparatus for performing the method are disclosed. Embodiments include: determining a layer of an IC design having features to be resolved by first and second masks; determining a difference of density by comparing a first density of a first set of the features with a second density of a second set of the features; determining a region on the layer of a first feature to be resolved by the first mask; and inserting, within the region, a polygon to be resolved by the second mask based on the difference of density.

Abstract: Methodology enabling a reduction in a density difference between two complementary exposure masks and/or windows of a layout and an apparatus for performing the method are disclosed. Embodiments include: determining a layer of an IC design having features to be resolved by first and second masks; determining a difference of density by comparing a first density of a first set of the features with a second density of a second set of the features; determining a region on the layer of a first feature to be resolved by the first mask; and inserting, within the region, a polygon to be resolved by the second mask based on the difference of density.

Abstract: A process and apparatus are provided for automated pattern-based semiconductor design layout correction. Embodiments include scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern, determining a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern, and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.

Abstract: Disclosed are systems and methods for controlling lateral deformation and reducing axial displacement, also referred to as walking, of a subsea conduit such as a pipeline for conveying produced hydrocarbon fluids. The systems and methods include the installation of rolling assemblies on the conduit at predetermined locations. The rolling assemblies include elements for forming rolling modules rotatable with respect to the conduit. Also disclosed is a system for monitoring displacement of the conduit over time.

Abstract: Disclosed are systems and methods for controlling lateral deformation and reducing axial displacement, also referred to as walking, of a subsea conduit such as a pipeline for conveying produced hydrocarbon fluids. The systems and methods include the installation of rolling assemblies on the conduit at predetermined locations. The rolling assemblies include elements for forming rolling modules rotatable with respect to the conduit. Also disclosed is a system for monitoring displacement of the conduit over time.

Abstract: Novel methods of treating subjects afflicted with an androgen-dependent disorder, such as prostate cancer and benign prostatic hyperplasia are disclosed. Specifically, methods of treating androgen-dependent disorders by introducing a polypeptide or a polynucleotide encoding the polypeptide, which enhances inactivation of active androgens, are described.

Abstract: Novel methods of treating subjects afflicted with an androgen-dependent disorder, such as prostate cancer and benign prostatic hyperplasia are disclosed. Specifically, methods of treating androgen-dependent disorders by introducing a polypeptide or a polynucleotide encoding the polypeptide, which enhances inactivation of active androgens, are described.

Abstract: A method, device and kit for the quantitative determination of lipoprotein components, especially cholesterol and triglycerides, in body fluids, especially human serum, plasma or whole blood utilizing the selective adsorption of lipoproteins on particulate silica. This selective adsorption is also useful for the quantitative separation of lipoproteins from samples of whole blood for diagnostic purposes.

Abstract: A reagent for use in solid phase immunoassay diagnostics comprises a matrix of non-active hybridoma cells embedded with its self-produced, covalently bound, actively presented monoclonal antibodies.The solid phase reagent according to the invention is prepared by incubating in vitro a culture medium containing active hybridoma cells capable of producing monoclonal antibodies, allowing the formation of antibodies to proceed, separating and washing said cells, resuspending the cells in a buffer solution, adding to the resulting suspension an inactivator substance capable of converting active hybridoma cells into the non-active state.