Patents by Inventor M.L. Supakanok Thongyai

M.L. Supakanok Thongyai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Small block copolymer of polyimide
    Patent number: 8617657
    Abstract: A method of making a block polyimide copolymer containing a first small block copolymer segment and a second larger block segment includes the steps of (a) reacting a first aromatic acid dianhydride with an aromatic diamine in a molar ratio from about 10:100 to about 50:100, respectively, to obtain the small block copolymer, (b) reacting the small block copolymer and excess amount of diamine with a second acid dianhydride in such a quantity that a total aromatic acid dianhydride and a total aromatic diamine are equimolar to obtain a precursor solution containing the first small block copolymer segment and the second larger block segment, (c) forming a film, laminate, or coating on a substrate, and (d) cyclodehydrating the film, laminate, or coating by chemical or thermal imidization.
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: December 31, 2013
    Assignee: Chulalongkorn University
    Inventors: Piyasan Praserthdam, M. L. Supakanok Thongyai, Sonti Khamsa-Nga
  • SMALL BLOCK COPOLYMER OF POLYIMIDE
    Publication number: 20090061096
    Abstract: A method of making a block polyimide copolymer containing a first small block copolymer segment and a second larger block segment includes the steps of (a) reacting a first aromatic acid dianhydride with an aromatic diamine in a molar ratio from about 10:100 to about 50:100, respectively, to obtain the small block copolymer, (b) reacting the small block copolymer and excess amount of diamine with a second acid dianhydride in such a quantity that a total aromatic acid dianhydride and a total aromatic diamine are equimolar to obtain a precursor solution containing the first small block copolymer segment and the second larger block segment, (c) forming a film, laminate, or coating on a substrate, and (d) cyclodehydrating the film, laminate, or coating by chemical or thermal imidization.
    Type: Application
    Filed: August 26, 2008
    Publication date: March 5, 2009
    Applicants: CHULALONGKORN UNIVERSITY, MEKTEC MANUFACTURING CORPORATION (THAILAND) LTD.
    Inventors: Piyasan Praserthdam, M.L. Supakanok Thongyai, Sonti Khamsa-Nga