Patents by Inventor M. Lee Love, Jr.

M. Lee Love, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for removing residues from a semiconductor substrate
    Patent number: 6033993
    Abstract: A process of treating a substrate having photoresist applied thereto, comprising the steps of:(a) removing said photoresist from said substrate by a method selected from the group consisting of photoresist stripping, plasma etch residue cleaning, or a combination thereof; and(b) rinsing said substrate with a non-corrosive rinsing composition comprising(1) water; and(2) one or more water-soluble corrosion inhibitors selected from the group consisting essentially of hydroxylamine, at least one hydroxylammonium salt, at least one water-soluble organic acid, at least one amino acid, and combinations thereof.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: March 7, 2000
    Assignee: Olin Microelectronic Chemicals, Inc.
    Inventors: M. Lee Love, Jr., Kenji Honda