Patents by Inventor M. Rahman

M. Rahman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoactive Compounds
    Publication number: 20080058542
    Abstract: The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions.
    Type: Application
    Filed: October 18, 2007
    Publication date: March 6, 2008
    Inventors: M. Rahman, Francis Houlihan
  • PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS
    Publication number: 20080035556
    Abstract: The present invention provides a method of reducing metals in solutions of film forming resins and a related filter sheet.
    Type: Application
    Filed: October 17, 2007
    Publication date: February 14, 2008
    Inventors: Munirathna Padmanaban, M. Rahman
  • Photoactive compounds
    Publication number: 20070111138
    Abstract: The present invention relates to novel photoacid generators.
    Type: Application
    Filed: February 16, 2006
    Publication date: May 17, 2007
    Inventors: M. Rahman, Munirathna Padmanaban
  • Photoactive compounds
    Publication number: 20070015084
    Abstract: The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R500—SO3? or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R500, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.
    Type: Application
    Filed: February 16, 2006
    Publication date: January 18, 2007
    Inventors: M. Rahman, Francis Houlihan, Munirathna Padmanaban, SangHo Lee, Ralph Dammel, David Rentkiewicz, Clement Anyadiegwu
  • Photoresist composition for deep UV and process thereof
    Publication number: 20060110677
    Abstract: The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.
    Type: Application
    Filed: November 22, 2004
    Publication date: May 25, 2006
    Inventors: Francis Houlihan, Ralph Dammel, Andrew Romano, Munirathna Padmanaban, M. Rahman
  • Process for producing film forming resins for photoresist compositions
    Publication number: 20060102554
    Abstract: The present invention provides a method of reducing metals in solutions of film forming resins and a related filter sheet.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Inventors: Munirathna Padmanaban, M. Rahman
  • Photoactive compounds
    Publication number: 20050271974
    Abstract: The present invention relates to novel photoacid generators.
    Type: Application
    Filed: June 8, 2004
    Publication date: December 8, 2005
    Inventors: M. Rahman, Woo-Kyu Kim, Munirathna Padmanaban, Sangho Lee
  • Photoresist composition for deep UV and process thereof
    Publication number: 20050130058
    Abstract: The present invention relates to a novel photoresist composition sensitive to radiation in the deep ultraviolet and a process for imaging the composition. The photoresist composition comprises a) a novel polymer that is insoluble in an aqueous alkaline solution and comprises at least one acid labile group, and b) a compound capable of producing an acid upon irradiation. The novel polymer of the present invention comprises at least one unit with a bisester group, (—C(O)OWC(O)O—), attached on one side to a polymer backbone unit (A) comprising an aliphatic group, and attached on the other side to an adamantyl group. The invention also relates to the novel polymer and a novel monomer for obtaining the novel polymer.
    Type: Application
    Filed: December 11, 2003
    Publication date: June 16, 2005
    Inventor: M. Rahman