Abstract: A method of reducing the dimension of an imprint structure on a substrate, the method comprising the steps of: (a) providing a substrate having at least one imprint structure thereon, said structure being formed of an inorganic-organic compound comprising an inorganic moiety and a polymer moiety, said polymer moiety having a lower vaporization temperature than the melting point of said inorganic moiety; and (b) selectively removing at least part of the polymer moiety while enabling at least part of the inorganic moiety to form a substantially continuous inorganic phase in said imprint structure, wherein the removal of the at least part of the polymer moiety from the imprint structure reduces the dimension of the imprint structure.

Abstract: There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1: wherein n is 1-12; and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloakyl, cycloakenyl, aryl, and aralkyl.

Abstract: A method of reducing the dimension of an imprint structure on a substrate, the method comprising the steps of: (a) providing a substrate having at least one imprint structure thereon, said structure being formed of an inorganic-organic compound comprising an inorganic moiety and a polymer moiety, said polymer moiety having a lower vaporization temperature than the melting point of said inorganic moiety; and (b) selectively removing at least part of the polymer moiety while enabling at least part of the inorganic moiety to form a substantially continuous inorganic phase in said imprint structure, wherein the removal of the at least part of the polymer moiety from the imprint structure reduces the dimension of the imprint structure.