Patents by Inventor M. Zlaul Karim

M. Zlaul Karim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing
    Patent number: 6720251
    Abstract: A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, acceptable values of the refractive index n and extinction coefficient k can be obtained. The nitrogen-free anti-reflective layer produced by this technique eliminates the mushrooming and footing problems found with conventional anti-reflective layers.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: April 13, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Bart van Schravendijk, Ming Li, Jason Tian, Tom Mountsier, M. Zlaul Karim