Abstract: A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.

Abstract: The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.

Abstract: The present invention relates to a method for reducing the power consumption of a charged particle system, the charged particle system comprising at least one charged particle optics element and a cooling assembly configured for cooling the at least one charged particle optics element, the method comprising the steps of running the charged particle system in a standby mode, wherein the total power consumption of the charged particle system is reduced compared to running the charged particle system in an operating mode. Furthermore, the present invention relates to a respective charged particle system.

Abstract: Systems and methods for transferring a sample from a transmission electron microscope (TEM) column are described herein. In one aspect, a method can include transferring a sample positioned in a holder capsule of a TEM sample holder from a vacuum chamber of a TEM into a load lock of the TEM; filling the load lock with a protecting gas; sealing the holder capsule of the TEM sample holder under the protecting gas; and removing the TEM sample holder from the load lock.

Abstract: A method for reducing throughput time in a sample image acquisition session in transmission electron microscopy comprises: providing an electron microscope comprising a sample component, a beam generator, an adjusting component, and a filtering component; securing a sample by using the sample component; generating an electron beam by using the beam generator; generating an image beam by directing the beam to the sample component; adjusting at least one of the beam and the image beam by using the adjusting component to obtain at least one modified image beam, wherein the adjusting is performed in such a way, that off-axial aberration of the modified image beam is minimized; and filtering the modified image beam via the filtering component to reduce resolution-deteriorating effect of chromatic aberration on the modified image beam resulting from the adjusting of the at least one of the beam and the image beam.

Abstract: A method for electron microscopy comprises: adjusting at least one of an electron beam and an image beam in such a way that off-axial aberrations inflicted on at least one of the electron beam and the image beam are minimized, the adjusting performed by using a beam adjusting component to obtain at least one modified image beam, wherein the adjusting comprises applying both shifting and tilting to at least one of the electron beam and the image beam and wherein the amount of tilting of at least one of the electron beam and the image beam depends on the amount of shifting of at least one of the electron beam and the image beam respectively and wherein the amount of tilting is computed based on at least one of coma and astigmatism introduced as a consequence of the shift.

Abstract: A method for electron microscopy comprises: adjusting at least one of an electron beam and an image beam in such a way that off-axial aberrations inflicted on at least one of the electron beam and the image beam are minimized, the adjusting performed by using a beam adjusting component to obtain at least one modified image beam, wherein the adjusting comprises applying both shifting and tilting to at least one of the electron beam and the image beam and wherein the amount of tilting of at least one of the electron beam and the image beam depends on the amount of shifting of at least one of the electron beam and the image beam respectively and wherein the amount of tilting is computed based on at least one of coma and astigmatism introduced as a consequence of the shift.

Abstract: The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-axial aberrations and correcting a diffraction pattern of the resulting modified beam. The invention also relates to a method for reducing throughput time in a sample image acquisition session in transmission electron microscopy. The method comprises providing an electron microscope, generating a beam and an image beam, adjusting one of the two to reduce off-axial aberrations and filtering the resulting modified image beam. The invention further relates to an electron microscope and to a non-transient computer-readable medium with a computer program for carrying out the methods.

Abstract: The disclosure relates to a method for examining a sample in a scanning transmission charged particle microscope. The method comprises the steps of providing a scanning transmission charged particle microscope, having an illuminator and a scanning unit. The method comprises the steps of providing a desired dose for at least a first sample location of the plurality of sample locations; and determining, using a controller of the microscope, a first set of parameter settings for the illuminator and the scanning unit for substantially achieving the desired dose at the first sample location.

Abstract: The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-axial aberrations and correcting a diffraction pattern of the resulting modified beam. The invention also relates to a method for reducing throughput time in a sample image acquisition session in transmission electron microscopy. The method comprises providing an electron microscope, generating a beam and an image beam, adjusting one of the two to reduce off-axial aberrations and filtering the resulting modified image beam. The invention further relates to an electron microscope and to a non-transient computer-readable medium with a computer program for carrying out the methods.

Abstract: A method, includes, with an illumination system, directing a first charged particle beam along a particle-optical axis to a specimen position, with an imaging system, receiving a second charged particle beam from the specimen position and directing the second charged particle beam to a detector, recording a first output of the detector, varying an excitation of an optical element of the imaging system with a controller so as to rotate the second charged particle beam at the detector through a yaw angle about the particle-optical axis, and recording a second output of the detector at the yaw angle.

Abstract: A charged particle microscope and a method of operating a charged particle microscope are disclosed. The microscope employs a source for producing charged particles, and a source lens below the source to form a charged particle beam which is directed onto a specimen by a condenser system. A detector collects radiation emanating from the specimen in response to irradiation of the specimen by the beam. The source lens is a compound lens, focusing the beam within a vacuum enclosure using both a magnetic lens having permanent magnets outside the enclosure to produce a magnetic field at the beam, and a variable electrostatic lens within the enclosure.

Abstract: The invention relates to a method for adjusting a Cs corrector in a STEM using a crystalline sample. The method comprises recording a through-focus series, converting the obtained images to Fourier space, thus forming a set of images alike diffraction images. By then determining the symmetry of the Fourier images, the corrector can be tuned for better symmetry, and the transfer limit can be determined by determining the maximum distance of the spots from the center. By repeatedly performing these steps, the corrector can be tuned to its optimum performance.

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.