Patents by Inventor Maarten Constant Dekker

Maarten Constant Dekker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and a device manufacturing method
    Publication number: 20060001850
    Abstract: A lithographic apparatus and device manufacturing method are disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes a shaft having a first threaded section and a second threaded section. The first threaded section and the second threaded section have different pitches.
    Type: Application
    Filed: July 2, 2004
    Publication date: January 5, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Constant Dekker, Edwin Eduard Krijnen