Patents by Inventor Maarten Frans, Janus KREMERS
Maarten Frans, Janus KREMERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11621142Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.Type: GrantFiled: August 12, 2020Date of Patent: April 4, 2023Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Peter Paul Hempenius, Maarten Frans Janus Kremers, Robertus Jacobus Theodorus Van Kempen, Sven Antoin Johan Hol, Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Niels Johannes Maria Bosch, Maarten Hartger Kimman
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Patent number: 11315752Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: GrantFiled: December 10, 2020Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
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Patent number: 11131937Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.Type: GrantFiled: December 20, 2019Date of Patent: September 28, 2021Assignee: ASML Netherlands B.V.Inventors: Michaël Johannes Christiaan Ronde, Johannes Hubertus Antonius Van De Rijdt, Maarten Frans Janus Kremers, Erik Maria Rekkers
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Publication number: 20210151282Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: ApplicationFiled: December 10, 2020Publication date: May 20, 2021Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
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Patent number: 10867770Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: GrantFiled: May 2, 2019Date of Patent: December 15, 2020Assignee: ASML Netherlands B.V.Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
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Publication number: 20200373118Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.Type: ApplicationFiled: August 12, 2020Publication date: November 26, 2020Inventors: Marcel Koenraad Marie BAGGEN, Peter Paul HEMPENIUS, Maarten Frans Janus KREMERS, Robertus Jacobus Theodorus VAN KEMPEN, Sven Antoin Johan HOL, Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Niels Johannes Maria BOSCH, Maarten Hartger KIMMAN
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Publication number: 20200201196Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.Type: ApplicationFiled: December 20, 2019Publication date: June 25, 2020Inventors: Michaël Johannes Christiaan RONDE, Johannes Hubertus Antonius VAN DE RIJDT, Maarten Frans Janus KREMERS, Erik Maria REKKERS
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Publication number: 20190341224Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: ApplicationFiled: May 2, 2019Publication date: November 7, 2019Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN