Patents by Inventor Maarten Johannes Wilhelmus Van Herpen

Maarten Johannes Wilhelmus Van Herpen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radical cleaning arrangement for a lithographic apparatus
    Publication number: 20070145295
    Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Vladimir Ivanov, Johannes Josephina Moors, Bastiaan Wolschrijn, Derk Jan Klunder, Maarten Johannes Wilhelmus Van Herpen