Patents by Inventor Maarten Marinus VAN OENE

Maarten Marinus VAN OENE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device manufacturing method and computer program
    Patent number: 11372339
    Abstract: A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: June 28, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Giovanni Luca Gattobigio, Pieter Jeroen Johan Emanuel Hoefnagels, Ronald Frank Kox, Marcus Johannes Van Der Zanden, Maarten Marinus Van Oene, Jorge Alberto Vieyra Salas
  • DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM
    Publication number: 20220187717
    Abstract: A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.
    Type: Application
    Filed: February 27, 2020
    Publication date: June 16, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Giovanni Luca GATTOBIGIO, Pieter Jeroen Johan Emanuel HOEFNAGELS, Ronald Frank KOX, Marcus Johannes VAN DER ZANDEN, Maarten Marinus VAN OENE, Jorge Alberto VIEYRA SALAS