Patents by Inventor Maarten Van Kampen
Maarten Van Kampen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220205900Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.Type: ApplicationFiled: December 28, 2021Publication date: June 30, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Saeedeh Farokhipoor, Maarten Van Kampen
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Publication number: 20210079519Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.Type: ApplicationFiled: February 21, 2019Publication date: March 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV
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Patent number: 10481510Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: GrantFiled: May 8, 2018Date of Patent: November 19, 2019Assignee: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Patent number: 10359710Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.Type: GrantFiled: October 25, 2016Date of Patent: July 23, 2019Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Jeroen Marcel Huijbregtse, Maarten Van Kampen, Pieter-Jan Van Zwol
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Publication number: 20180307146Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.Type: ApplicationFiled: October 25, 2016Publication date: October 25, 2018Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus SCHIMMEL, Jeroen Marcel HUIJBREGTSE, Maarten VAN KAMPEN, Pieter-Jan VAN ZWOL
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Publication number: 20180259846Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: ApplicationFiled: May 8, 2018Publication date: September 13, 2018Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
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Patent number: 9989844Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: GrantFiled: September 29, 2016Date of Patent: June 5, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Patent number: 9773578Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.Type: GrantFiled: January 14, 2014Date of Patent: September 26, 2017Assignee: ASML Netherlands B.V.Inventors: Alexey Sergeevich Kuznetsov, Arjen Boogaard, Jeroen Marcel Huijbregtse, Andrey Nikipelov, Maarten Van Kampen
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Patent number: 9606445Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.Type: GrantFiled: July 30, 2013Date of Patent: March 28, 2017Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Arthur Winfried Eduardus Minnaert, Marcel Johannus Elisabeth Hubertus Muitjens, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi, Hans Joerg Mallmann, Kurstat Bal, Carlo Cornelis Maria Luijten, Han-Kwang Nienhuys, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling, Pedro Julian Rizo Diago, Maarten Van Kampen, Nicolaas Aldegonda Jan Maria Van Aerle
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Publication number: 20170017150Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: ApplicationFiled: September 29, 2016Publication date: January 19, 2017Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
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Patent number: 9482960Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: GrantFiled: February 14, 2014Date of Patent: November 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Patent number: 9395630Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.Type: GrantFiled: March 17, 2011Date of Patent: July 19, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Patent number: 9354529Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).Type: GrantFiled: July 30, 2012Date of Patent: May 31, 2016Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Dirk Heinrich Ehm, Maarten van Kampen, Stefan-Wolfgang Schmidt, Vadim Yevgenyevich Banine, Erik Loopstra
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Publication number: 20160012929Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.Type: ApplicationFiled: January 14, 2014Publication date: January 14, 2016Applicant: ASML Netherlands B.V.Inventors: Alexey Sergeevich KUZNETSOV, Arjen BOOGAARD, Jeroen Marcel HUIJBREGTSE, Andrey NIKIPELOV, Maarten VAN KAMPEN
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Publication number: 20150192861Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.Type: ApplicationFiled: July 30, 2013Publication date: July 9, 2015Applicant: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Arthur Winfried Eduardus Minnaert, Johannus Elisabeth Hubertus Muitjens, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi, Hans Joerg Mallmann, Kurstat Bal, Carlo Cornelis Maria Luijten, Han-Kwang Nienhuys, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling, Pedro Julian Rizo Diago, Maarten Van Kampen, Nicolaas Aldegonda Jan Maria Van Aerle
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Publication number: 20140160455Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.Type: ApplicationFiled: February 14, 2014Publication date: June 12, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Ven Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Publication number: 20130114059Abstract: A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of said metal in an air environment prior to operation. This prevents contamination of optical components by subsequent evaporation of the oxide during operation of the component at elevated temperatures.Type: ApplicationFiled: June 6, 2011Publication date: May 9, 2013Applicant: ASML Netherlands B.V.Inventors: Martin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Wouter Anthon Soer, Andrei Mikhailovich Yakunn, Maarten Van Kampen, Gerard Frans Jozef Schasfoort
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Publication number: 20130088699Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.Type: ApplicationFiled: March 17, 2011Publication date: April 11, 2013Applicant: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
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Publication number: 20130077064Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).Type: ApplicationFiled: July 30, 2012Publication date: March 28, 2013Inventors: Dirk Heinrich Ehm, Maarten van Kampen, Stefan-Wolfgang Schmidt, Vadim Yevgenyevich Banine, Erik Loopstra
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Publication number: 20120200913Abstract: In order to limit the negative effect of metal contamination on reflectivity within an EUV lithography device, a reflective optical element is proposed for the extreme ultraviolet and soft X-ray wavelength range with a reflective surface with an uppermost layer, in which the uppermost layer comprises one or more organic silicon compounds with a carbon-silicon and/or silicon-oxygen bond.Type: ApplicationFiled: February 17, 2012Publication date: August 9, 2012Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT GMBHInventors: MAARTEN VAN KAMPEN, DIRK HEINRICH EHM, ROGIER VERBERK, JEROEN HUIJBREGTSE