Patents by Inventor Maarten Wilhelmus Van Herpen

Maarten Wilhelmus Van Herpen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation system and lithographic apparatus
    Publication number: 20070115443
    Abstract: The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source for generating extreme ultraviolet radiation, a contamination barrier for trapping contamination from the radiation source, and a temperature sensor for sensing a temperature of the contamination barrier.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 24, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wilhelmus Box, Derk Klunder, Maarten Wilhelmus Van Herpen, Niels Driessen
  • Radiation system and lithographic apparatus
    Publication number: 20060261290
    Abstract: A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.
    Type: Application
    Filed: May 20, 2005
    Publication date: November 23, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maarten Wilhelmus Van Herpen, Vadim Banine, Arnoud Wassink, Derk Klunder