Patents by Inventor Machiko Obi

Machiko Obi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of plasma etching
    Publication number: 20050101140
    Abstract: A plasma etching method includes the steps of exciting an etching gas introduced in a processing vessel into a plasma, the etching gas including 1,1,1,4,4,5,5,5-octafluoro-2-pentyne, and carrying out a plasma etching on a film on a target object accommodated in the processing vessel via opening patterns of a resist mask on the film. Therefore, it is possible to perform plasma etching having a high selectivity to resist and/or suppressing the etch stop.
    Type: Application
    Filed: September 27, 2004
    Publication date: May 12, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tomoyo Yamaguchi, Kiwamu Fujimoto, Akinori Kitamura, Jae Jeong, Takashi Fuse, Machiko Obi, Nobuhiro Wada
  • Etching method
    Publication number: 20030153193
    Abstract: This invention is a plasma-etching method including: making into plasma a process gas including C2F4 gas that has been introduced into a processing container, maintaining a pressure around an object to be processed arranged in the processing container within a range of 45 to 75 mTorr, and etching an SiO2 film in the object to be processed through a resist-pattern arranged on the SiO2 film by using the plasma.
    Type: Application
    Filed: February 13, 2003
    Publication date: August 14, 2003
    Inventors: Takashi Fuse, Machiko Obi