Patents by Inventor Maciek E. Orczyk

Maciek E. Orczyk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Enhancing light coupling efficiency for ultra high numerical aperture lithography through first order transmission optimization
    Publication number: 20040165271
    Abstract: A first order transmission optimization (FOTO) top coat may be provided on a photoresist layer to improve the coupling efficiency of first order diffracted light waves during a lithographic imaging operation. The top coat may be a relatively thin layer of a relatively low absorption, low refractive index material. The top coat may be provided in addition to a bottom anti-reflective coating (BARC).
    Type: Application
    Filed: February 21, 2003
    Publication date: August 26, 2004
    Inventors: Christof Gabriel Krautschik, Maciek E. Orczyk, John M. Urata