Abstract: The composition comprises of a component A selected from a hydroxylated derivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of a hexose, and their mixtures; and a component B selected from quinic acid, shikimic acid, their alkaline metal or alkaline earth salts, their methyl esters, and mixtures of the same. This composition is suitable for protecting the skin against ultraviolet radiation coming from the sun or artificial sources, such as those used in phototherapy units and in sun tanning rooms. For application in the field of dermatology and nutrition, and, in particular, in the photoprotection of the skin and mucosa, photo-ageing and photocarcinogenesis, including protection of the immune system associated with the skin.

Abstract: The invention provides new methods and products for use in photoprotection from ultraviolet radiation. The products include extracts from ferns of the genus Polypodium mixed in prepartions for topical application and oral administration. The preparations have both photoprotective and antioxidant properties. The topical formulations may also include physical and/or chemical sunscreen agents and/or cosmetic agents.