Patents by Inventor Mads HOMMELGAARD

Mads HOMMELGAARD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250221629
    Abstract: Described herein are sensors for measuring various parameters. The sensors may be used in systems, devices, and methods for controlling blood flow or for measuring (e.g., monitoring) blood pressure, pH, or analyte levels such as a lactate level, an oxygen level, and/or a carbon dioxide level. The sensors may include a membrane configured to generate a measurable response (e.g., a change in an electrical signal such as resistance, capacitance, current, voltage) when the membrane interacts with a parameter of interest. In some instances, the sensors may include a piezoresistive MEMS subassembly. In other instances, the sensors may include an electrochemical membrane.
    Type: Application
    Filed: November 29, 2024
    Publication date: July 10, 2025
    Inventors: David POISNER, Samuel LARSON, Mads HOMMELGAARD, Brian S. STRACHAN
  • Patent number: 9601203
    Abstract: A solid-state non-volatile memory (NVM) device includes a memory bit cell. The memory bit cell includes a field effect transistor (FET) fabricated on a substrate and having a floating gate. The floating gate includes a thick oxide layer. The FET includes drain and source, each fabricated within the substrate and coupled to the floating gate and a channel region with native doping. The drain is fabricated to have a halo region. A method for fabricating a solid-state NVM device includes fabricating solid state device including NVM bit cell which provides multiple storage and includes an FET on substrate. The method also includes fabricating floating gate of the FET including thick gate oxide layer, and fabricating drain and source of FET within the substrate, drain and source coupled to the floating gate and channel region with native doping. Further, the method includes fabricating halo region within the substrate at the drain.
    Type: Grant
    Filed: June 9, 2012
    Date of Patent: March 21, 2017
    Assignee: Synopsys, Inc.
    Inventors: Mads Hommelgaard, Andrew Horch, Martin Niset
  • Publication number: 20130328117
    Abstract: A solid-state non-volatile memory (NVM) device includes a memory bit cell. The memory bit cell includes a field effect transistor (FET) fabricated on a substrate and having a floating gate. The floating gate includes a thick oxide layer. The FET includes drain and source, each fabricated within the substrate and coupled to the floating gate and a channel region with native doping. The drain is fabricated to have a halo region. A method for fabricating a solid-state NVM device includes fabricating solid state device including NVM bit cell which provides multiple storage and includes an FET on substrate. The method also includes fabricating floating gate of the FET including thick gate oxide layer, and fabricating drain and source of FET within the substrate, drain and source coupled to the floating gate and channel region with native doping. Further, the method includes fabricating halo region within the substrate at the drain.
    Type: Application
    Filed: June 9, 2012
    Publication date: December 12, 2013
    Applicant: SYNOPSYS INC.
    Inventors: Mads HOMMELGAARD, Andrew HORCH, Martin NISET