Patents by Inventor Magdel Crum

Magdel Crum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Turbidity monitoring methods, apparatuses, and sensors
    Patent number: 7538880
    Abstract: Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing; a supply connection in fluid communication with the process chamber and configured to supply slurry to the process chamber; and a sensor configured to monitor the turbidity of the slurry. Another aspect provides a semiconductor workpiece processing method including providing a semiconductor process chamber; supplying slurry to the semiconductor process chamber; and monitoring the turbidity of the slurry using a sensor.
    Type: Grant
    Filed: April 7, 2004
    Date of Patent: May 26, 2009
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid
    Patent number: 7530877
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Grant
    Filed: March 2, 2000
    Date of Patent: May 12, 2009
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods
    Patent number: 7180591
    Abstract: Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing; a supply connection in fluid communication with the process chamber and configured to supply slurry to the process chamber; and a sensor configured to monitor the turbidity of the slurry. Another aspect provides a semiconductor workpiece processing method including providing a semiconductor process chamber; supplying slurry to the semiconductor process chamber; and monitoring the turbidity of the slurry using a sensor.
    Type: Grant
    Filed: March 7, 2000
    Date of Patent: February 20, 2007
    Assignee: Micron Technology, Inc
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor
    Publication number: 20070015443
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: September 15, 2006
    Publication date: January 18, 2007
    Inventors: Scott Moore, Scott Meikle, Magdel Crum
  • Semiconductor workpiece processing methods
    Patent number: 7118455
    Abstract: Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing; a supply connection in fluid communication with the process chamber and configured to a supply slurry to the process chamber; and a sensor configured to monitor the turbidity of the slurry. Another aspect provides a semiconductor workpiece processing method including providing a semiconductor process chamber; supplying slurry to the semiconductor process chamber; and monitoring the turbidity of the slurry using a sensor.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: October 10, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor workpiece processing methods, a method of preparing semiconductor workpiece process fluid, and a method of delivering semiconductor workpiece process fluid to a semiconductor processor
    Patent number: 7118445
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: October 10, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor workpiece processing methods
    Patent number: 7118447
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: October 10, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor processor control systems
    Publication number: 20050185180
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: February 23, 2005
    Publication date: August 25, 2005
    Inventors: Scott Moore, Scott Meikle, Magdel Crum
  • Methods of preparing semiconductor workpiece process fluid
    Publication number: 20050153632
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: February 23, 2005
    Publication date: July 14, 2005
    Inventors: Scott Moore, Scott Meikle, Magdel Crum
  • Semiconductor processor control systems, semiconductor processor systems, and systems configured to provide a semiconductor workpiece process fluid
    Publication number: 20050026547
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: August 31, 2004
    Publication date: February 3, 2005
    Inventors: Scott Moore, Scott Meikle, Magdel Crum
  • Turbidity monitoring methods, apparatuses, and sensors
    Publication number: 20040198183
    Abstract: Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing; a supply connection in fluid communication with the process chamber and configured to supply slurry to the process chamber; and a sensor configured to monitor the turbidity of the slurry. Another aspect provides a semiconductor workpiece processing method including providing a semiconductor process chamber; supplying slurry to the semiconductor process chamber; and monitoring the turbidity of the slurry using a sensor.
    Type: Application
    Filed: April 7, 2004
    Publication date: October 7, 2004
    Applicant: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Methods of preparing semiconductor workpiece process fluid and semiconductor workpiece processing methods
    Publication number: 20030199227
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: June 12, 2003
    Publication date: October 23, 2003
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor workpiece processing methods, a method of preparing semiconductor workpiece process fluid, and a method of delivering semiconductor workpiece process fluid to a semiconductor processor
    Publication number: 20030022593
    Abstract: Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor are provided. One aspect of the invention provides a semiconductor processor system including a process chamber adapted to process at least one semiconductor workpiece using a process fluid; a connection coupled with the process chamber and configured to receive the process fluid; a sensor coupled with the connection and configured to output a signal indicative of the process fluid; and a control system coupled with the sensor and configured to control at least one operation of the semiconductor processor system responsive to the signal.
    Type: Application
    Filed: March 21, 2001
    Publication date: January 30, 2003
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum
  • Semiconductor processors, sensors, and semiconductor processing systems
    Patent number: 6290576
    Abstract: Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods are provided. According to one aspect, a semiconductor processor includes a process chamber configured to receive a semiconductor workpiece for processing; a supply connection in fluid communication with the process chamber and configured to supply slurry to the process chamber; and a sensor configured to monitor the turbidity of the slurry. Another aspect provides a semiconductor workpiece processing method including providing a semiconductor process chamber; supplying slurry to the semiconductor process chamber; and monitoring the turbidity of the slurry using a sensor.
    Type: Grant
    Filed: June 3, 1999
    Date of Patent: September 18, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Scott E. Moore, Scott G. Meikle, Magdel Crum