Patents by Inventor Magdy S. Abdelrahman

Magdy S. Abdelrahman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Soluble hard mask for interlayer dielectric patterning
    Patent number: 7659196
    Abstract: Described herein are embodiments of a method that includes forming a hard mask over an interlayer dielectric layer, patterning said hard mask, etching said interlayer dielectric layer, and removing said hard mask during a post-etch clean with a wet etchant having a selectivity to etch said hard mask at a greater rate than said interlayer dielectric layer.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: February 9, 2010
    Assignee: Intel Corporation
    Inventors: Magdy S. Abdelrahman, Makarem A. Hussein
  • Hard mask for low-k interlayer dielectric patterning
    Patent number: 7649264
    Abstract: Described herein are embodiments of a hard mask including a surface to reduce adhesion to an anti-reflective material deposited on a surface, wherein the surface to reduced adhesion provides use of a process to remove the anti-reflective material deposited on the surface that minimizes damage to an interlayer dielectric layer below the hard mask and methods of manufacturing the same.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: January 19, 2010
    Assignee: Intel Corporation
    Inventors: Tony V. Mule, Magdy S. Abdelrahman
  • Soluble hard mask for interlayer dielectric patterning
    Publication number: 20080153283
    Abstract: Described herein are embodiments of a method that includes forming a hard mask over an interlayer dielectric layer, patterning said hard mask, etching said interlayer dielectric layer, and removing said hard mask during a post-etch clean with a wet etchant having a selectivity to etch said hard mask at a greater rate than said interlayer dielectric layer.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventors: Magdy S. Abdelrahman, Makarem A. Hussein
  • Hard mask for low-k interlayer dielectric patterning
    Publication number: 20080079155
    Abstract: Described herein are embodiments of a hard mask including a surface to reduce adhesion to an anti-reflective material deposited on a surface, wherein the surface to reduced adhesion provides use of a process to remove the anti-reflective material deposited on the surface that minimizes damage to an interlayer dielectric layer below the hard mask and methods of manufacturing the same.
    Type: Application
    Filed: September 28, 2006
    Publication date: April 3, 2008
    Inventors: Tony V. Mule, Magdy S. Abdelrahman