Patents by Inventor MAHADEV JOSHI

MAHADEV JOSHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250116500
    Abstract: Embodiments of interferometric endpoint (IEP) housing assemblies for endpoint detection of plasma processing are provided herein. In some embodiments, IEP housing assemblies include: an IEP housing having an upper end configured to interface with a light source and having an internal cavity, wherein a lower end of the IEP housing is configured to interface with a dome assembly of a process chamber; a bracket having a body disposed about the IEP housing and having a plurality of arms extending radially outward from the body; and a plurality of biasing members extending from the body to the IEP housing and configured to hold the IEP housing within the body while allowing side-to-side deflection.
    Type: Application
    Filed: October 10, 2023
    Publication date: April 10, 2025
    Inventors: Trishul BYREGOWDA SHIVALINGAIAH, Skanda Simha CHANDRASHEKAR, Karthik Melinamane PRABHAKAR, Mahadev JOSHI, Peter F. DEMONTE
  • Patent number: 12094740
    Abstract: A method and apparatus for polishing a substrate is disclosed herein. More specifically, the apparatus relates to an integrated CMP system for polishing substrates. The CMP system has a polishing station configured to polish substrates. A spin rinse dry (SRD) station configured to clean and dry the substrates. A metrology station configured to measure parameters of the substrates. A robot configured to move the substrate in to and out of the SRD station. And an effector rinse and dry (EERD) station configured to clean and dry an end effector of the robot.
    Type: Grant
    Filed: March 25, 2021
    Date of Patent: September 17, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Manoj A. Gajendra, Mahadev Joshi, Joseph Antony Jonathan, Jamie S. Leighton
  • Patent number: 11551942
    Abstract: Methods and apparatus for removing substrate contamination are provided herein. In some embodiments, a multi-chamber processing apparatus includes: a processing chamber for processing a substrate; a factory interface (FI) coupled to the processing chamber via a load lock chamber disposed therebetween; and a cleaning chamber coupled to the FI and configured to rinse and to dry the substrate, wherein the cleaning chamber includes a chamber body defining an interior volume and having a first opening at an interface with the FI for transferring the substrate into and out of the interior volume.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: January 10, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manoj A. Gajendra, Kyle Moran Hanson, Mahadev Joshi, Arvind Thiyagarajan, Jon Christian Farr
  • Publication number: 20220310424
    Abstract: A method and apparatus for polishing a substrate is disclosed herein. More specifically, the apparatus relates to an integrated CMP system for polishing substrates. The CMP system has a polishing station configured to polish substrates. A spin rinse dry (SRD) station configured to clean and dry the substrates. A metrology station configured to measure parameters of the substrates. A robot configured to move the substrate in to and out of the SRD station. And an effector rinse and dry (EERD) station configured to clean and dry an end effector of the robot.
    Type: Application
    Filed: March 25, 2021
    Publication date: September 29, 2022
    Inventors: Manoj A. GAJENDRA, Mahadev JOSHI, Joseph Antony JONATHAN, Jamie S. LEIGHTON
  • Publication number: 20220084843
    Abstract: Methods and apparatus for removing substrate contamination are provided herein. In some embodiments, a multi-chamber processing apparatus includes: a processing chamber for processing a substrate; a factory interface (FI) coupled to the processing chamber via a load lock chamber disposed therebetween; and a cleaning chamber coupled to the FI and configured to rinse and to dry the substrate, wherein the cleaning chamber includes a chamber body defining an interior volume and having a first opening at an interface with the FI for transferring the substrate into and out of the interior volume.
    Type: Application
    Filed: September 15, 2020
    Publication date: March 17, 2022
    Inventors: Manoj A. GAJENDRA, Kyle Moran HANSON, Mahadev JOSHI, Arvind THIYAGARAJAN, Jon Christian FARR
  • Patent number: 9799548
    Abstract: Apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support includes a susceptor plate having a top surface; a recess formed within the top surface, wherein the recess is defined by an edge; and a plurality of angled support elements disposed within the recess and along the edge of the recess, wherein each angled support element comprises a first surface downwardly sloped toward a center of the recess.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: October 24, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Gangadhar Sheelavant, Mahadev Joshi, Yuji Aoki
  • Publication number: 20140265091
    Abstract: Apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support includes a susceptor plate having a top surface; a recess formed within the top surface, wherein the recess is defined by an edge; and a plurality of angled support elements disposed within the recess and along the edge of the recess, wherein each angled support element comprises a first surface downwardly sloped toward a center of the recess.
    Type: Application
    Filed: March 5, 2014
    Publication date: September 18, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: GANGADHAR SHEELAVANT, MAHADEV JOSHI, YUJI AOKI