Abstract: A method of concomitantly manufacturing at least two thin-film devices is provided, the method comprising: applying a solution on a first surface of a first planar substrate; positioning a second surface of a second planar substrate proximate to the first surface of the first planar substrate to provide parallelly disposed adjacent substrates, such that the first surface and the second surface are in contact with the solution; sliding the parallelly disposed adjacent substrates over one another such that the solution is drawn over the first surface and the second surface, which when the parallelly disposed adjacent substrates slide passed one another, provide a first coating on a first surface and a second coating on the second surface; and drying the first coating and the second coating, thereby concomitantly manufacturing at least two thin-film devices.

Abstract: A substrate processing system includes a liquid layer processor. The substrate processing system also includes an orchestrator. The orchestrator, after a liquid layer is deposited on a substrate: processes, using the liquid layer processor, the liquid layer to obtain a film. The film has an anisotropic conductivity. The film is disposed on the substrate. The film includes high aspect ratio conductive particles. The high aspect ratio conductive particles provide the anisotropic conductivity.

Abstract: A material composition for manufacturing a translucent conductive film includes a fluid. The material composition further includes nanostructures disposed within the fluid. The material composition further includes a component that modifies a structure of a joint formed between at least two nanostructures of the plurality of nanostructures after the component is activated. The component may be activated by applying heath or optical radiation to the component.

Abstract: A method of depositing nanowire chains includes applying a nanowire mixture to a chain-site. The chain-site includes a patterned conductive film covering at least a portion of a surface of a substrate. The patterned conductive film includes a gap. The method also includes, after applying the nanowire mixture, forming a nanowire chain suspended adjacent to a portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film; and depositing the nanowire chain across the gap by removing a liquid portion of the nanowire mixture. An average length of the nanowires of the nanowire mixture is less than a width of the gap.

Abstract: A material composition for manufacturing a translucent conductive film includes a fluid. The material composition further includes nanostructures disposed within the fluid. The material composition further includes a component that modifies a structure of a joint formed between at least two nanostructures of the plurality of nanostructures after the component is activated. The component may be activated by applying heath or optical radiation to the component.

Abstract: A method of depositing nanowire chains includes applying a nanowire mixture to a chain-site. The chain-site includes a patterned conductive film covering at least a portion of a surface of a substrate. The patterned conductive film includes a gap. The method also includes, after applying the nanowire mixture, forming a nanowire chain suspended adjacent to a portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film; and depositing the nanowire chain across the gap by removing a liquid portion of the nanowire mixture. An average length of the nanowires of the nanowire mixture is less than a width of the gap.

Abstract: A method of depositing nanowires including generating wells disposed on a patterned conductive film. The patterned conductive film includes well-sites. The patterned conducive film covers a portion of a surface of a substrate. Each of the wells is disposed proximate to a corresponding wellsite. The method includes applying a nanowire mixture to the wells and, after applying the nanowire mixture, at least one nanowire is deposited on a first portion and a second portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film. The first portion and the second portion of the patterned conductive film are separated by a gap.