Patents by Inventor Maikel Adrianus Cornelis Schepers
Maikel Adrianus Cornelis Schepers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9618835Abstract: In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.Type: GrantFiled: January 31, 2011Date of Patent: April 11, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria Direcks, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona
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Patent number: 8680493Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.Type: GrantFiled: June 5, 2012Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
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Patent number: 8638417Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.Type: GrantFiled: April 12, 2011Date of Patent: January 28, 2014Assignee: ASML Netherlands B.V.Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Marcus Johannes Van Der Zanden, Pieter Mulder
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Patent number: 8421993Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.Type: GrantFiled: May 7, 2009Date of Patent: April 16, 2013Assignee: ASML Netherlands B.V.Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten
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Patent number: 8405815Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.Type: GrantFiled: June 7, 2010Date of Patent: March 26, 2013Assignee: ASML Netherlands B.V.Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens
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Publication number: 20130001442Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.Type: ApplicationFiled: June 5, 2012Publication date: January 3, 2013Applicant: ASML Netherlands B.V.Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
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Publication number: 20110255062Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.Type: ApplicationFiled: April 12, 2011Publication date: October 20, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Danny Maria Hubertus PHILIPS, Daniel Jozef Maria DIRECKS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Marcus Johannes VAN DER ZANDEN, Pieter MULDER
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Publication number: 20110188012Abstract: In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.Type: ApplicationFiled: January 31, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria DIRECKS, Erik Henricus Egidius Catharina Eummelen, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Sergei Shulepov, Pieter Mulder, David Bessems, Marco Baragona
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Publication number: 20110013158Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.Type: ApplicationFiled: June 7, 2010Publication date: January 20, 2011Applicant: ASML Netherlands B.V.Inventors: Danny Maria Hubertus PHILIPS, Daniel Jozef Maria Direcks, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens
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Publication number: 20110007286Abstract: An immersion lithographic apparatus is disclosed that includes a substrate table configured to support a substrate, a projection system configured to direct a patterned beam of radiation onto a substrate, a liquid handling system configured to supply and confine immersion liquid to a space defined between a projection system and a substrate, or substrate table, or both, and a controller to control speed of motion of the substrate table relative to the liquid handling system during movement of the substrate table through a path under the liquid handling system based on a distance between turns in the path.Type: ApplicationFiled: June 11, 2010Publication date: January 13, 2011Applicant: ASML Netherlands B.V.Inventors: Daniel Jozef Maria DIRECKS, Nicolaas Rudolf KEMPER, Danny Maria Hubertus PHILIPS, Michel RIEPEN, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS
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Publication number: 20100060868Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.Type: ApplicationFiled: August 31, 2009Publication date: March 11, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Gheorghe Tanasa, Nicolaas Ten Kate, Johannes Petrus Martinus Bernardus Vermeulen, Danny Maria Hubertus Philips, Maikel Adrianus Cornelis Schepers, Laurentius Johannes Adrianus Van Bokhoven
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Publication number: 20090279062Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.Type: ApplicationFiled: May 7, 2009Publication date: November 12, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Koen STEFFENS, Arnold Jan VAN PUTTEN