Abstract: [Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqueous solution comprising an alkylcarboxylic acid compound (A) and a solvent (B), wherein the alkylcarboxylic acid compound (A) is represented by the formula (a): A1-COOH (a), wherein A1 is C4-12 alkyl, and the solvent (B) comprises water.

Abstract: Problem: A replacement liquid of liquid filling between resist patterns and a method for producing resist patterns using the same. Means of solution: To provide a replacement liquid of liquid filling between resist patterns comprising a sulfonyl group-containing compound (A); a nitrogen-containing compound (B); and a solvent (C).

Abstract: [Problem] To provide a semiconductor aqueous composition capable of preventing a pattern collapse and suppressing a bridge defect. [Means for Solution] A semiconductor aqueous composition comprising a single or plurality of surfactant(s) having a monovalent anion part represented by formula (I): Chain 1-X1—X2-Chain 2 (I) wherein, X1 and X2 are each independently —C(=0)- or —S(=0)2-, and Chain 1 and Chain 2 are each independently a linear or branched C1-20 alkyl, wherein one or more H in said C1-20 alkyl are replaced by F, and one or more methylenes in Chain 1 may be replaced by -0-, with the proviso that Chain 1 and Chain 2 may be bonded to form a ring structure) and a monovalent cation part other than hydrogen ion; and water.

Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.

Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.

Abstract: This invention relates to peptide ligand discovery and is particularly directed to a method for the discovery of agonists for membrane bound receptors. The inventive detection system involves the use of a "tethered" ligand for probing receptor binding. The general detection system includes a membrane, a membrane bound receptor, and a chimeric ligand presenting molecule. This chimeric protein forms the tethered ligand and in turn includes a membrane domain, a linker domain, a ligand domain, and a cleavable terminal domain. The "ligands" of the system are exposed by the addition of a specific peptidase that cleaves at the designated sequence. The sequence of the ligand that produces signal as a result of the interaction between the agonist and receptor can be then be isolated using sib selection.