Patents by Inventor Maki Ito

Maki Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050122005
    Abstract: An intermediate film (15, 12, 53) is formed on a substrate (11, 52), a bottom electrode (13, 542) is formed on top of this intermediate film, a ferroelectric film (24) or piezoelectric film (543) is formed on top of this bottom electrode by an ion beam assist method, and a top electrode (25, 541) is formed on top of this ferroelectric film or piezoelectric film. The ferroelectric film or piezoelectric film is formed by PZT, BST or a relaxer material. As a result of the use of an ion beam assist method in the formation of any one of the intermediate film, bottom electrode, ferroelectric film or piezoelectric film, a piezoelectric device or ferroelectric device which has a piezoelectric film or ferroelectric film with an in-plane orientation can be manufactured with good efficiency.
    Type: Application
    Filed: November 12, 2003
    Publication date: June 9, 2005
    Inventors: Takamitsu Higuchi, Setsuya Iwashita, Hiromu Miyazawa, Koji Sumi, Masami Murai, Maki Ito, Li Xin-Shan
  • Patent number: 6903821
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Grant
    Filed: November 5, 2002
    Date of Patent: June 7, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Publication number: 20050052482
    Abstract: A liquid-ejecting apparatus according to which targeted good characteristics can be obtained, and moreover the scope for material selection can be broadened is provided. The liquid-ejecting apparatus contracts a pressure chamber and thus ejects liquid through application of voltage to a piezoelectric body, and is such that the driving waveform applied to the piezoelectric body during the liquid ejecting operation comprises a high potential period (a2) in which a voltage exhibiting an electric field strength exceeding the coercive electric field of the piezoelectric body is applied, and a reverse potential period (a6) in which a voltage such that the potential becomes of the opposite polarity to the polarity in the high potential period or the potential becomes zero is applied.
    Type: Application
    Filed: September 11, 2002
    Publication date: March 10, 2005
    Inventors: Maki Ito, Masami Murai, Shiro Yazaki
  • Publication number: 20050012784
    Abstract: Provided are a liquid jet head and a liquid jet apparatus which are capable of reducing fluctuation of a displacement amount of a vibration plate by driving of piezoelectric elements. A liquid jet head comprising: a passage-forming substrate on which pressure generating chambers communicating with nozzle orifices are defined, and a piezoelectric element composed of a lower electrode, a piezoelectric layer and an upper electrode, which are provided on the passage-forming substrate while interposing a via a vibration plate therebetween, wherein, both ends of the piezoelectric layer in its width direction at a pressure generating chamber side are positioned in an opening region of the pressure generating chamber, and a relationship between a width x of the piezoelectric layer at the pressure generating chamber side and a width y of the pressure generating chamber at a vibration plate side satisfies 0.75?x/y?1.
    Type: Application
    Filed: August 1, 2003
    Publication date: January 20, 2005
    Inventor: Maki Ito
  • Patent number: 6667381
    Abstract: In the process of the present invention for producing an aliphatic poly(ester carbonate), maleic anhydride, a C2-20 glycol and hydrogen are reacted in the presence of a hydrogenating catalyst. By this process, an aliphatic poly(ester carbonate) having practically satisfactory moldability and physical properties is produced in a short period of time by a simplified method as compared to conventional production processes.
    Type: Grant
    Filed: October 17, 2002
    Date of Patent: December 23, 2003
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Kyohei Takakuwa, Kunitoshi Mimura, Maki Ito, Noriko Dodo
  • Publication number: 20030078364
    Abstract: In the process of the present invention for producing an aliphatic poly(ester carbonate), maleic anhydride, a C2-20 glycol and hydrogen are reacted in the presence of a hydrogenating catalyst. By this process, an aliphatic poly(ester carbonate) having practically satisfactory moldability and physical properties is produced in a short period of time by a simplified method as compared to conventional production processes.
    Type: Application
    Filed: October 17, 2002
    Publication date: April 24, 2003
    Inventors: Kyohei Takakuwa, Kunitoshi Mimura, Maki Ito, Noriko Dodo
  • Publication number: 20030058444
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: November 5, 2002
    Publication date: March 27, 2003
    Applicant: HITACHI, LTD.
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Kohichi Hayakawa, Maki Ito
  • Patent number: 6493082
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: December 10, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Patent number: 6476913
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: November 5, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Maki Ito
  • Publication number: 20020113967
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: April 5, 2002
    Publication date: August 22, 2002
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Publication number: 20020109088
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: April 5, 2002
    Publication date: August 15, 2002
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Publication number: 20020105648
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: April 4, 2002
    Publication date: August 8, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Patent number: 6421122
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Grant
    Filed: April 11, 2001
    Date of Patent: July 16, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Patent number: 6359380
    Abstract: In a color cathode ray tube having a vacuum vessel that comprises a panel, a neck for housing an electron gun therein, and a funnel for connecting the panel and the neck, in which the inner surface of the panel glass is coated with a phosphor layer in different colors to give a display screen; the panel glass contains ions capable of selectively absorbing light within the range of visible rays, and its outer surface is coated with an electric conductive surface film.
    Type: Grant
    Filed: March 1, 1999
    Date of Patent: March 19, 2002
    Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd
    Inventors: Masahiro Nishizawa, Toshio Tojo, Norikazu Uchiyama, Maki Ito, Kiyoshi Miura, Hidetsugu Matsukiyo, Tomoji Ohishi, Daigoro Kamoto
  • Publication number: 20010019411
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: April 11, 2001
    Publication date: September 6, 2001
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Publication number: 20010011706
    Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.
    Type: Application
    Filed: April 11, 2001
    Publication date: August 9, 2001
    Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
  • Patent number: 6018070
    Abstract: A two-rings-containing phenyl ester compound of the following general formula (1), ##STR1## wherein R.sup.1 is a linear alkyl group having 5 to 12 carbon atoms, R.sup.2 is a linear alkyl group having 1 to 15 carbon atoms, X.sup.1 and X.sup.2 are both hydrogen atoms or one of X.sup.1 and X.sup.2 is a fluorine atom and the other is a hydrogen atom, Y.sup.1 and Y.sup.2 are both hydrogen atoms or one of Y.sup.1 and Y.sup.2 is a fluorine atom and the other is a hydrogen atom, and A.sup.1 is a hydrogen atom, --CH.sub.3 or --CF.sub.3, provided that when A.sup.1 is a hydrogen atom or --CH.sub.3, p is 0 and that when A.sup.1 is --CF.sub.3, p is 1 and q is an integer of 5 to 8, and an anti-ferroelectric liquid crystal composition containing at least one of two-rings-containing phenyl ester compounds of the above general formula (1) in claim 1 and either an anti-ferroelectric liquid crystal compound or a mixture of anti-ferroelectric liquid crystal compounds.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: January 25, 2000
    Assignee: Mitsubishi Gas Chemicals Company, Inc.
    Inventors: Maki Ito, Tomoyuki Yui, Masahiro Johno, Teruyo Tomiyama, Hiroshi Mineta, Yuki Motoyama
  • Patent number: 5880224
    Abstract: A process for producing an aliphatic polyester carbonate which comprises reacting (1) an aliphatic dicarboxylic acid compound containing succinic acid as a main component, (2) an aliphatic dihydroxy compound containing 1,4-butanediol as a main component, and (3) (a) a polyhydric alcohol having 3 or more hydroxyl groups in a molecule, (b) a polybasic carboxylic acid compound having 3 or more carboxyl groups in a molecule, or (c) a polybasic carboxylic acid having one or more hydroxyl groups in a molecule to obtain an aliphatic polyester oligomer and reacting the obtained aliphatic polyester oligomer and a carbonate compound, wherein the aliphatic polyester carbonate has a melt tension of 1.5 g or more at 190.degree. C.
    Type: Grant
    Filed: July 28, 1997
    Date of Patent: March 9, 1999
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Mitsuo Miura, Kyohei Takakuwa, Takayasu Fujimori, Maki Ito
  • Patent number: 5728864
    Abstract: A liquid crystal compound of the formula (1) ##STR1## wherein R is a linear alkyl group having 6 to 12 carbon atoms,both X and Y are hydrogen atoms or one of X and Y is a fluorine atom and the other is a hydrogen atom,A is --CF.sub.3 or --C.sub.2 F.sub.5,m is an integer of 2 to 4,n is an integer of 2 to 4, andC* is an asymmetric carbon,having a ferrielectric phase in its phase sequence, or a ferrielectric liquid crystal composition containing the liquid crystal compound of the formula (1) having a ferrielectric phase, may be injected between substrates provided with nonlinear active elements, such as thin film transistors or diodes formed on each pixel, to form an active matrix liquid crystal display device.
    Type: Grant
    Filed: April 12, 1996
    Date of Patent: March 17, 1998
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yuki Motoyama, Tomoyuki Yui, Masahiro Johno, Maki Ito, Takahiro Matsumoto, Hiroshi Mineta
  • Patent number: 5660762
    Abstract: A two-rings-containing phenyl ester compound of the following general formula (1), ##STR1## wherein R.sup.1 is a linear alkyl group having 5 to 12 carbon atoms, R.sup.2 is a linear alkyl group having 1 to 15 carbon atoms, X.sup.1 and X.sup.2 are both hydrogen atoms or one of X.sup.1 and X.sup.2 is a fluorine atom and the other is a hydrogen atom, Y.sup.1 and Y.sup.2 are both hydrogen atoms or one of Y.sup.1 and Y.sup.2 is a fluorine atom and the other is a hydrogen atom, and A.sup.1 is a hydrogen atom, --CH.sub.3 or --CF.sub.3, provided that when A.sup.1 is a hydrogen atom or --CH.sub.3, p is 0 and that when A.sup.1 is --CF.sub.3, p is t and q is an integer of 5 to 8, and an anti-ferroelectric liquid crystal composition containing at least one of two-rings-containing phenyl ester compounds of the above general formula (1) in claim 1 and either an anti-ferroelectric liquid crystal compound or a mixture of anti-ferroelectric liquid crystal compounds.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: August 26, 1997
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Maki Ito, Tomoyuki Yui, Masahiro Johno, Teruyo Tomiyama, Hiroshi Mineta, Yuki Motoyama