Patents by Inventor Maki Ito
Maki Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20050168524Abstract: A manufacturing method of a liquid jet head having increased the durability and reliability thereof by preventing delamination of a vibration plate is provided. At least the following two steps are included: a vibration plate forming step which includes at least a step of forming a zirconium layer on one side of a passage-forming substrate by sputtering so that a degrees of orientation to a (002) plane of the surface becomes equal to 80% or more, as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.Type: ApplicationFiled: November 24, 2004Publication date: August 4, 2005Inventors: Li Xin-Shan, Hironobu Kazama, Masami Murai, Koji Sumi, Maki Ito, Toshiaki Yokouchi
-
Patent number: 6919564Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: April 5, 2002Date of Patent: July 19, 2005Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Publication number: 20050122005Abstract: An intermediate film (15, 12, 53) is formed on a substrate (11, 52), a bottom electrode (13, 542) is formed on top of this intermediate film, a ferroelectric film (24) or piezoelectric film (543) is formed on top of this bottom electrode by an ion beam assist method, and a top electrode (25, 541) is formed on top of this ferroelectric film or piezoelectric film. The ferroelectric film or piezoelectric film is formed by PZT, BST or a relaxer material. As a result of the use of an ion beam assist method in the formation of any one of the intermediate film, bottom electrode, ferroelectric film or piezoelectric film, a piezoelectric device or ferroelectric device which has a piezoelectric film or ferroelectric film with an in-plane orientation can be manufactured with good efficiency.Type: ApplicationFiled: November 12, 2003Publication date: June 9, 2005Inventors: Takamitsu Higuchi, Setsuya Iwashita, Hiromu Miyazawa, Koji Sumi, Masami Murai, Maki Ito, Li Xin-Shan
-
Patent number: 6903821Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: November 5, 2002Date of Patent: June 7, 2005Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Publication number: 20050052482Abstract: A liquid-ejecting apparatus according to which targeted good characteristics can be obtained, and moreover the scope for material selection can be broadened is provided. The liquid-ejecting apparatus contracts a pressure chamber and thus ejects liquid through application of voltage to a piezoelectric body, and is such that the driving waveform applied to the piezoelectric body during the liquid ejecting operation comprises a high potential period (a2) in which a voltage exhibiting an electric field strength exceeding the coercive electric field of the piezoelectric body is applied, and a reverse potential period (a6) in which a voltage such that the potential becomes of the opposite polarity to the polarity in the high potential period or the potential becomes zero is applied.Type: ApplicationFiled: September 11, 2002Publication date: March 10, 2005Inventors: Maki Ito, Masami Murai, Shiro Yazaki
-
Publication number: 20050012784Abstract: Provided are a liquid jet head and a liquid jet apparatus which are capable of reducing fluctuation of a displacement amount of a vibration plate by driving of piezoelectric elements. A liquid jet head comprising: a passage-forming substrate on which pressure generating chambers communicating with nozzle orifices are defined, and a piezoelectric element composed of a lower electrode, a piezoelectric layer and an upper electrode, which are provided on the passage-forming substrate while interposing a via a vibration plate therebetween, wherein, both ends of the piezoelectric layer in its width direction at a pressure generating chamber side are positioned in an opening region of the pressure generating chamber, and a relationship between a width x of the piezoelectric layer at the pressure generating chamber side and a width y of the pressure generating chamber at a vibration plate side satisfies 0.75?x/y?1.Type: ApplicationFiled: August 1, 2003Publication date: January 20, 2005Inventor: Maki Ito
-
Patent number: 6667381Abstract: In the process of the present invention for producing an aliphatic poly(ester carbonate), maleic anhydride, a C2-20 glycol and hydrogen are reacted in the presence of a hydrogenating catalyst. By this process, an aliphatic poly(ester carbonate) having practically satisfactory moldability and physical properties is produced in a short period of time by a simplified method as compared to conventional production processes.Type: GrantFiled: October 17, 2002Date of Patent: December 23, 2003Assignee: Mitsubishi Gas Chemical Co., Inc.Inventors: Kyohei Takakuwa, Kunitoshi Mimura, Maki Ito, Noriko Dodo
-
Publication number: 20030078364Abstract: In the process of the present invention for producing an aliphatic poly(ester carbonate), maleic anhydride, a C2-20 glycol and hydrogen are reacted in the presence of a hydrogenating catalyst. By this process, an aliphatic poly(ester carbonate) having practically satisfactory moldability and physical properties is produced in a short period of time by a simplified method as compared to conventional production processes.Type: ApplicationFiled: October 17, 2002Publication date: April 24, 2003Inventors: Kyohei Takakuwa, Kunitoshi Mimura, Maki Ito, Noriko Dodo
-
Publication number: 20030058444Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: November 5, 2002Publication date: March 27, 2003Applicant: HITACHI, LTD.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Kohichi Hayakawa, Maki Ito
-
Patent number: 6493082Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: April 5, 2002Date of Patent: December 10, 2002Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Patent number: 6476913Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: November 29, 1999Date of Patent: November 5, 2002Assignee: Hitachi, Ltd.Inventors: Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Maki Ito
-
Publication number: 20020113967Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 5, 2002Publication date: August 22, 2002Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Publication number: 20020109088Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 5, 2002Publication date: August 15, 2002Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Publication number: 20020105648Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 4, 2002Publication date: August 8, 2002Applicant: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Patent number: 6421122Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: April 11, 2001Date of Patent: July 16, 2002Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Patent number: 6359380Abstract: In a color cathode ray tube having a vacuum vessel that comprises a panel, a neck for housing an electron gun therein, and a funnel for connecting the panel and the neck, in which the inner surface of the panel glass is coated with a phosphor layer in different colors to give a display screen; the panel glass contains ions capable of selectively absorbing light within the range of visible rays, and its outer surface is coated with an electric conductive surface film.Type: GrantFiled: March 1, 1999Date of Patent: March 19, 2002Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., LtdInventors: Masahiro Nishizawa, Toshio Tojo, Norikazu Uchiyama, Maki Ito, Kiyoshi Miura, Hidetsugu Matsukiyo, Tomoji Ohishi, Daigoro Kamoto
-
Publication number: 20010019411Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: September 6, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Publication number: 20010011706Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: August 9, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
-
Patent number: 6018070Abstract: A two-rings-containing phenyl ester compound of the following general formula (1), ##STR1## wherein R.sup.1 is a linear alkyl group having 5 to 12 carbon atoms, R.sup.2 is a linear alkyl group having 1 to 15 carbon atoms, X.sup.1 and X.sup.2 are both hydrogen atoms or one of X.sup.1 and X.sup.2 is a fluorine atom and the other is a hydrogen atom, Y.sup.1 and Y.sup.2 are both hydrogen atoms or one of Y.sup.1 and Y.sup.2 is a fluorine atom and the other is a hydrogen atom, and A.sup.1 is a hydrogen atom, --CH.sub.3 or --CF.sub.3, provided that when A.sup.1 is a hydrogen atom or --CH.sub.3, p is 0 and that when A.sup.1 is --CF.sub.3, p is 1 and q is an integer of 5 to 8, and an anti-ferroelectric liquid crystal composition containing at least one of two-rings-containing phenyl ester compounds of the above general formula (1) in claim 1 and either an anti-ferroelectric liquid crystal compound or a mixture of anti-ferroelectric liquid crystal compounds.Type: GrantFiled: April 18, 1997Date of Patent: January 25, 2000Assignee: Mitsubishi Gas Chemicals Company, Inc.Inventors: Maki Ito, Tomoyuki Yui, Masahiro Johno, Teruyo Tomiyama, Hiroshi Mineta, Yuki Motoyama
-
Patent number: 5880224Abstract: A process for producing an aliphatic polyester carbonate which comprises reacting (1) an aliphatic dicarboxylic acid compound containing succinic acid as a main component, (2) an aliphatic dihydroxy compound containing 1,4-butanediol as a main component, and (3) (a) a polyhydric alcohol having 3 or more hydroxyl groups in a molecule, (b) a polybasic carboxylic acid compound having 3 or more carboxyl groups in a molecule, or (c) a polybasic carboxylic acid having one or more hydroxyl groups in a molecule to obtain an aliphatic polyester oligomer and reacting the obtained aliphatic polyester oligomer and a carbonate compound, wherein the aliphatic polyester carbonate has a melt tension of 1.5 g or more at 190.degree. C.Type: GrantFiled: July 28, 1997Date of Patent: March 9, 1999Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Mitsuo Miura, Kyohei Takakuwa, Takayasu Fujimori, Maki Ito