Patents by Inventor Maki Kimura

Maki Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12500061
    Abstract: The invention provides an observation system capable of observing a formation position of a target shape that cannot be directly irradiated with an electron beam. The observation system includes an electron microscope and a computer. The electron microscope is configured to irradiate, with an electron beam, a first surface position on a specimen, which is different from a formation position of a target shape on the specimen, detect predetermined electrons that are scattered in the specimen from the first surface position and that escape from the formation position of the target shape to an outside of the specimen, and output the predetermined electrons as a detection signal. The computer is configured to output one or more values related to the target shape based on the detection signal.
    Type: Grant
    Filed: January 9, 2023
    Date of Patent: December 16, 2025
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hiroaki Kasai, Kenji Yasui, Mayuka Osaki, Maki Kimura, Makoto Suzuki
  • Publication number: 20250306474
    Abstract: A method for evaluating a pattern formed on a surface of a semiconductor wafer includes: setting a feature space including a plurality of features that are calculatable from sensing data of the pattern; and calculating, in the feature space, a deviation as a vector between a coordinate in the feature space calculated from an evaluation object and a coordinate of a reference point or in a reference space in the feature space set in advance as a comparison object.
    Type: Application
    Filed: April 1, 2025
    Publication date: October 2, 2025
    Inventors: Kenji YASUI, Mayuka Osaki, Hiroaki Kasai, Maki Kimura, Takahiro Kawasaki
  • Publication number: 20240041733
    Abstract: A dental care composition including an isothiocyanate having a sulfinyl group (—S(?O)—), a sulphonyl group (—S(?O)2—), a sulfide bond (—S—), or an aryl group, and an isothiocyanate group (—N?C?S). And, a composition used to promote activation of a TRPA1 channel and to promote activation of a reaction catalyzed by carbonic anhydrase.
    Type: Application
    Filed: December 22, 2021
    Publication date: February 8, 2024
    Inventors: Isao Okunishi, Yoshiyuki Shibukawa, Maki Kimura
  • Publication number: 20230238210
    Abstract: The invention provides an observation system capable of observing a formation position of a target shape that cannot be directly irradiated with an electron beam. The observation system includes an electron microscope and a computer. The electron microscope is configured to irradiate, with an electron beam, a first surface position on a specimen, which is different from a formation position of a target shape on the specimen, detect predetermined electrons that are scattered in the specimen from the first surface position and that escape from the formation position of the target shape to an outside of the specimen, and output the predetermined electrons as a detection signal. The computer is configured to output one or more values related to the target shape based on the detection signal.
    Type: Application
    Filed: January 9, 2023
    Publication date: July 27, 2023
    Applicant: Hitachi High-Tech Corporation
    Inventors: Hiroaki KASAI, Kenji YASUI, Mayuka OSAKI, Maki KIMURA, Makoto SUZUKI
  • Publication number: 20230230886
    Abstract: To provide a technique capable of quantitatively grasping a change in three-dimensional shape including a cross-sectional shape of a pattern within a surface of a wafer or between wafers in a non-destructive manner before cross-sectional observation.
    Type: Application
    Filed: December 14, 2022
    Publication date: July 20, 2023
    Applicant: Hitachi High-Tech Corporation
    Inventors: Kenji YASUI, Mayuka OSAKI, Hitoshi NAMAI, Yuki OJIMA, Wataru NAGATOMO, Masami IKOTA, Maki KIMURA
  • Patent number: 9488815
    Abstract: An pattern evaluation method includes a step of estimating imaging deviation allowed to evaluate an overlay position on one or more evaluation point candidates based on pattern layout information, a step of deciding one or more evaluation points from among the evaluation point candidates based on the allowed imaging deviation, a step of deciding an imaging sequence for imaging the selected evaluation point, and a step of evaluating an overlay position between first and second patterns based on an image obtained by imaging the evaluation point according to the imaging sequence.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: November 8, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Mayuka Osaki, Maki Kimura, Chie Shishido
  • Publication number: 20150235804
    Abstract: A charged particle microscope system with a charged particle microscope including an irradiation unit that irradiates a subject to be inspected with a charged particle beam and a detection unit having a detector that detects a charged particle signal from the subject to be inspected irradiated by the irradiation unit; a signal processing unit that converts the charged particle signal detected by the detector of the charged particle microscope into an image signal; and an arithmetic processing unit that corrects the image signal converted by the signal processing unit with the use of signal conversion characteristics.
    Type: Application
    Filed: August 7, 2013
    Publication date: August 20, 2015
    Inventors: Mayuka Osaki, Maki Kimura, Chie Shishido, Katsuhiro Sasada
  • Publication number: 20140320627
    Abstract: An pattern evaluation method includes a step of estimating imaging deviation allowed to evaluate an overlay position on one or more evaluation point candidates based on pattern layout information, a step of deciding one or more evaluation points from among the evaluation point candidates based on the allowed imaging deviation, a step of deciding an imaging sequence for imaging the selected evaluation point, and a step of evaluating an overlay position between first and second patterns based on an image obtained by imaging the evaluation point according to the imaging sequence.
    Type: Application
    Filed: January 30, 2013
    Publication date: October 30, 2014
    Inventors: Atsushi Miyamoto, Mayuka Osaki, Maki Kimura, Chie Shishido
  • Patent number: 7136822
    Abstract: An outgo time of first customers in a service providing store such as a restaurant is estimated and is notified to a second customer who made a reservation without time designation. Information relative to a usage amount of money of the first customers in a restaurant is obtained, and an accumulated usage amount of money per customer is calculated. Then, it is judged whether the accumulated usage amount of money per customer exceeds a predetermined reference amount of money. If a second customer makes a reservation for a reservation unit including the seat of the first customers and it is judged that the accumulated usage amount of money of the customer exceeds the predetermined reference amount of money, an outgo time of the first customers, which is obtained by adding a reference time to a time, is notified to the second customer. Thus, the second customer can go to the restaurant in view of the outgo time.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: November 14, 2006
    Assignee: Fujitsu Limited
    Inventors: Maki Kimura, Takashi Yugami
  • Publication number: 20030097283
    Abstract: An outgo time of first customers in a service providing store such as a restaurant is estimated and is notified to a second customer who made a reservation without time designation. Information relative to a usage amount of money of the first customers in a restaurant is obtained, and an accumulated usage amount of money per customer is calculated. Then, it is judged whether the accumulated usage amount of money per customer exceeds a predetermined reference amount of money. If a second customer makes a reservation for a reservation unit including the seat of the first customers and it is judged that the accumulated usage amount of money of the customer exceeds the predetermined reference amount of money, an outgo time of the first customers, which is obtained by adding a reference time to a time, is notified to the second customer. Thus, the second customer can go to the restaurant in view of the outgo time.
    Type: Application
    Filed: February 27, 2002
    Publication date: May 22, 2003
    Applicant: Fujitsu Limited
    Inventors: Maki Kimura, Takashi Yugami