Patents by Inventor Maki Kunitake

Maki Kunitake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050181201
    Abstract: A release film having a release layer on at least one surface of a base film, the proportion of silicon atoms to carbon atoms (Si/C) in the surface of said release layer being not more than 0.01, the proportion of halogen atoms to carbon atoms (X/C) being not more than 0.1, the peel force of said release film being not more than 75 mN/cm, and the retained adhesion rate of said release film being not less than 80%. This release film contains substantially no silicon and halogen elements and is of the easy release type.
    Type: Application
    Filed: January 17, 2003
    Publication date: August 18, 2005
    Inventors: Masahi Tate, Osamu Nishizawa, Maki Kunitake, Motohiro Seki