Patents by Inventor Maki Tanaka

Maki Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010002697
    Abstract: An inspection method and apparatus which controls an acceleration voltage of an electron beam, irradiates the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, detects at least one of a secondary electron and a reflected electron emanated from the object by the irradiating, obtains an image of the object from the detected electron by using positional information of the stage, conducts inspection or measurement of the object using the image obtained, and outputs a result of the inspection or the measurement through a network system which is connected to a computer.
    Type: Application
    Filed: January 3, 2001
    Publication date: June 7, 2001
    Inventors: Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama, Yuji Takagi, Hiroyuki Shinada, Mari Nozoe, Aritoshi Sugimoto
  • Patent number: 6236057
    Abstract: A method and apparatus for inspecting a pattern, a first image of a first area on a sample is acquired by imaging the first area formed as a first pattern, and the first image is memorized. A second image of a second area on the sample is acquired by imaging the second area formed as a second pattern which is to be the same as the first pattern. A defect of the first pattern is detected by acquiring a differential image between the first image and the second image. The detection of the defect includes processing the differential image by using information of brightness corresponding to both of the first image and the second image.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: May 22, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Chie Shishido, Takashi Hiroi, Haruo Yoda, Masahiro Watanabe, Asahiro Kuni, Maki Tanaka, Takanori Ninomiya, Hideaki Doi, Shunji Maeda, Mari Nozoe, Hiroyuki Shinoda, Atsuko Takafuji, Aritoshi Sugimoto, Yasutsugu Usami
  • Patent number: 6172365
    Abstract: An electron beam inspection method including the steps of irradiating an electron beam to an object to be inspected, detecting at least one of a secondary electron and a reflected electron emanated from the object by the irradiation of the electron beam, and obtaining an image of the object from the detected electron. The method further includes the steps of controlling an electric field in a neighborhood of the object for filtering the at least one of the secondary and reflected electron emanated from the object so as to control the contrast of the image, detecting at least one of the secondary and reflected electron emanated from the object which passes through the electric field in the neighborhood of the object by the irradiation of the electron beam, and conducting inspection or measurement of the object on the basis of a detected signal of the detection in the controlled electric field.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: January 9, 2001
    Assignee: Hitachi. Ltd.
    Inventors: Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama, Yuji Takagi, Hiroyuki Shinada, Mari Nozoe, Aritoshi Sugimoto
  • Patent number: 6172363
    Abstract: A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
    Type: Grant
    Filed: March 4, 1997
    Date of Patent: January 9, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
  • Patent number: 6107637
    Abstract: An electronic beam type exposure or inspection or measurement apparatus and method including an electron optical system, an electron beam image detection optical system for detecting a secondary electron beam image generated from an inspected object by electron beams irradiated from the electron optical system, and an optical height detection apparatus for optically detecting a height of a surface in an area on the inspected object. A focus controller is provided for calculating a focus control current or a focus control voltage based on a correction parameter between a height of a surface on the inspected object and a focus control current or a focus control voltage and supplying the same to an objective lens of the electron optical system in such a manner that an electron beam is focused on the inspected object in a properly- focused state.
    Type: Grant
    Filed: August 11, 1998
    Date of Patent: August 22, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada, Yasutsugu Usami
  • Patent number: 6087673
    Abstract: In a method of inspecting a defect and an apparatus thereof, an allowable range for a gradation value of a difference image is determined for each pixel from one pixel or less of position shift quantity between two images to be compared, a variation rate in a local gradation value of an image, and a representative value of the local gradation value. Then, by comparing the gradation value of the difference image with the allowable range determined for each pixel, a pixel, on which the gradation value of the difference image is within the allowable range, is judged to be an non-defective candidate and a pixel, on which the gradation value of the difference image is beyond the allowable range, is judged to be a defective candidate.
    Type: Grant
    Filed: May 20, 1998
    Date of Patent: July 11, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Chie Shishido, Takashi Hiroi, Haruo Yoda, Masahiro Watanabe, Asahiro Kuni, Maki Tanaka, Takanori Ninomiya, Hideaki Doi, Shunji Maeda, Mari Nozoe, Hiroyuki Shinoda, Atsuko Takafuji, Aritoshi Sugimoto, Yasutsugu Usami
  • Patent number: 5986263
    Abstract: An electron beam inspection method and apparatus. The method includes controlling acceleration voltage of electron beam and electric field on a sample, beam current, beam diameter, image detection rate, image dimensions, precharge, discharge, or a combination of them, exposing an object to the electron beam, detecting in a sensor a physical change generated from the object, and inspecting or measuring the object on the basis of a signal representing the detected physical change. The apparatus includes an electron source (potential E2) for generating an electron beam, a deflector for scanning generated electrons, an objective lens for focusing the electron beam upon the object, a grid (potential E1) disposed between the object and the objective lens, a wafer holder (potential E0) for holding the object, a sensor for detecting generated secondary electrons, a potential controller for controlling the potential E0, E1 and E2, and a storage for storing optimum potential conditions.
    Type: Grant
    Filed: March 26, 1997
    Date of Patent: November 16, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama, Yuji Takagi, Hiroyuki Shinada, Mari Nozoe, Aritoshi Sugimoto
  • Patent number: 5116953
    Abstract: An aqueous lactoferrin solution can be thermally treated for heat pasteurization or spray drying purposes substantially without impairing the iron-binding ability of the lactoferrin by first adjusting the ionic strength thereof in accordance with the formulae, wherein I is ionic strength and T is temperature (.degree.C.):log I.ltoreq.-T/10+5 (60.ltoreq.T.ltoreq.80.degree. C.)log I.ltoreq.-3 (T.gtoreq.80.degree. C.).
    Type: Grant
    Filed: October 17, 1989
    Date of Patent: May 26, 1992
    Assignee: Snow Brand Milk Products Co., Ltd.
    Inventors: Shunichi Dosako, Rika Shinooka, Maki Tanaka
  • Patent number: 5008120
    Abstract: A method of preparing iron-fortified beverage, wherein either aqueous solution of lactoferrin, iron and sodium bicarbonate or aqueous solution of iron lactoferrin is adjusted to the ionic strength to satisfy the conditions given by the formulae below and sterilized by heat; solution of the ingredients other than the above is also sterilized by heat; and the two are mixed to obtain the product: and a method of processing iron-fortified beverage, wherein all ingredients including lactoferrin are dissolved in water and, if the ionic strength of the solution is adjustable to the conditions given by the following formulae, adjusted to the ionic strength given, and sterilized by heat to obtain the product.log I.ltoreq.-T/66.7-0.1(wherein 60.ltoreq.T.ltoreq.80)log 1.ltoreq.-1.3(T.gtoreq.80)(T indicates temperature of sterilization in degrees Celsius.
    Type: Grant
    Filed: July 12, 1990
    Date of Patent: April 16, 1991
    Assignee: Snow Brand Milk Products Co., Ltd.
    Inventors: Maki Tanaka, Teiichi Tojima, Shun-ichi Dousako, Kiyoshi Tatsumi