Patents by Inventor Makiko Kogo

Makiko Kogo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7909926
    Abstract: The present invention relates to an ammonium salt or a sodium salt of an anthrapyridone compound represented by the following the formula (1): and an ink composition containing these; said compound has a hue with high vividness and high brightness suitable for inkjet recording; recorded matters recorded with an ink composition containing said compound is excellent in fastnesses such as light fastness and ozone fastness, and also particularly water fastness.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: March 22, 2011
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Hiroyuki Matsumoto, Yutaka Ishii, Noriko Kajiura, Makiko Kogo
  • Publication number: 20090324900
    Abstract: The present invention relates to an ammonium salt or a sodium salt of an anthrapyridone compound represented by the following the formula (1): and an ink composition containing these; said compound has a hue with high vividness and high brightness suitable for inkjet recording; recorded matters recorded with an ink composition containing said compound is excellent in fastnesses such as light fastness and ozone fastness, and also particularly water fastness.
    Type: Application
    Filed: August 8, 2007
    Publication date: December 31, 2009
    Inventors: Hiroyuki Matsumoto, Yutaka Ishii, Noriko Kajiura, Makiko Kogo
  • Patent number: 7521099
    Abstract: To provide a photopolymerization initiator having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. A liquid crystal sealing material comprising (a) a reactive photopolymerization initiator represented by the general formula (1) and (b) a photocurable resin: (wherein R1 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; R2 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; Ar represents an arylene group; R3 represents a hydrogen atom or a methyl group; X and Y respectively represent O or S; and Z is a hydroxyl group or a morpholino group).
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: April 21, 2009
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoyuki Ochi, Toyohumi Asano, Masahiro Imaizumi, Masaru Kudou, Eiichi Nishihara, Masahiro Hirano, Kouta Yoshii, Sumio Itimura, Makiko Kogo
  • Publication number: 20070258033
    Abstract: [PROBLEMS] To provide a photopolymerization initiator having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. [MEANS FOR SOLVING PROBLEMS] A liquid crystal sealing material comprising (a) a reactive photopolymerization initiator represented by the general formula (1) and (b) a photocurable resin: (wherein R1 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; R2 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; Ar represents an arylene group; R3 represents a hydrogen atom or a methyl group; X and Y respectively represent O or S; and Z is a hydroxyl group or a morpholino group).
    Type: Application
    Filed: August 31, 2005
    Publication date: November 8, 2007
    Inventors: Naoyuki Ochi, Toyohumi Asano, Masahiro Imaizumi, Masaru Kudou, Eiichi Nishihara, Masahiro Hirano, Kouta Yoshii, Sumio Itimura, Makiko Kogo