Patents by Inventor Makiko Tamaoki

Makiko Tamaoki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Impurity measuring device
    Patent number: 6190520
    Abstract: A first solution is brought into contact with a surface of a sample so that impurities, which exist in the sample or on the surface of the sample, and the sample are dissolved in the first solution, and a voltage is applied across electrodes by putting the electrodes into the first solution so that substances including the impurities are deposited on the surface of the electrodes, and the deposited impurities are dissolved in a second solution so that impurities dissolved in the second solution are measured. As a result, an impurity measuring method and an impurity measuring device, which are capable of measuring a very small amount of impurities with high sensitivity, which exist in the sample or on the surface of the sample, are provided.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: February 20, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makiko Tamaoki, Yumi Sasaki
  • Method of measuring impurities
    Patent number: 5882504
    Abstract: A first solution is brought into contact with a surface of a sample so that impurities, which exist in the sample or on the surface of the sample, and the sample are dissolved in the first solution, and a voltage is applied across electrodes by putting the electrodes into the first solution so that substances including the impurities are deposited on the surface of the electrodes, and the deposited impurities are dissolved in a second solution so that impurities dissolved in the second solution are measured. As a result, an impurity measuring method and an impurity measuring device, which are capable of measuring a very small amount of impurities with high sensitivity, which exist in the sample or on the surface of the sample, are provided.
    Type: Grant
    Filed: December 3, 1996
    Date of Patent: March 16, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makiko Tamaoki, Yumi Sasaki
  • Method of measuring amount of organic material adsorbed to surface of semiconductor substrate
    Patent number: 5426057
    Abstract: A method of measuring the amount of organic material adhered to the surface of a semiconductor substrate. In the method, a metal is precipitated by bringing the reaction solution into contact with organic material on the surface of semiconductor substrate. The amount of the organic material adhered to the semiconductor substrate can be determined by detecting the amount of the metal precipitated.
    Type: Grant
    Filed: March 15, 1994
    Date of Patent: June 20, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Makiko Tamaoki