Abstract: There is provided a liquid discharge apparatus including: a print head including a first connector; a substrate unit including a second connector fitted to the first connector and a third connector different from the second connector; and a relay substrate including a first cable through which a first voltage signal supplied to the substrate unit propagates, a second cable through which a second voltage signal supplied to the substrate unit propagates, a fourth connector fitted to the third connector, a relay substrate front surface, and a relay substrate back surface opposite to the relay substrate front surface, in which the first cable and the second cable are electrically coupled to the relay substrate front surface, the fourth connector is provided on the relay substrate back surface, and the first voltage signal and the second voltage signal propagate to the fourth connector.

Abstract: There is provided a liquid discharge apparatus including a substrate unit, and includes a wiring substrate having a plurality of rigid members and flexible member, in which a first rigid member, and a second rigid member are positioned facing each other, a third rigid member laminated on a first surface of a third region of the flexible member is positioned such that a normal direction of a third front surface intersects a normal direction of a first front surface and a second front surface, the second connector is provided on a fourth rigid member laminated on a second surface of a third region of the flexible member, and a size of the third rigid member and a fourth rigid member is smaller than a size of the print head when a first discharge section is viewed from the first connector.

Abstract: There is provided a rotary electric machine that ensures improving a maximum torque and a rated power factor while reducing an increase in a starting current. In view of this, the rotary electric machine includes a shaft, a rotor, and a stator. The rotor is fixed to an outer periphery of the shaft. The stator is located so as to surround an outer periphery of the rotor. The rotor includes a rotor iron core including a plurality of rotor slots located at predetermined intervals in a circumferential direction and rotor bars inserted into the rotor slots. Rotor slits communicate with outer peripheral sides of the rotor slots. The rotor slits have a width ws in a circumferential direction. The width ws is smaller than a height hs in a radial direction of the rotor slit, and when a rated current is denoted as I1, a turn ratio (primary/secondary) is denoted as Tr, and a magnetic permeability in a vacuum is denoted as ?0, a relationship of ws>?0×I1×Tr/0.6 is met.

Abstract: An object of the present invention is to provide a novel method for producing L-cysteine in place of a conventional fermentation method. More specifically, the object is to provide a method for producing L-cysteine by the combination of heat-resistant enzymes. In particular, the object is to provide a method for efficiently producing a pathway for synthesizing O-phosphoserine from 3-phosphoglyceric acid (3PG) via phosphohydroxypyruvic acid (HPV). The present invention solved the problem by a method for producing O-phosphoserine including acting phosphoserine aminotransferase (PSAT) and 3-phosphoglycerate dehydrogenase (PGDH) that are each derived from a thermophilic bacterium on 3PG to generate O-phosphoserine, and a method for producing L-cysteine including the step described above.

Abstract: There is provided a rotary electric machine that ensures improving a maximum torque and a rated power factor while reducing an increase in a starting current. In view of this, the rotary electric machine includes a shaft, a rotor, and a stator. The rotor is fixed to an outer periphery of the shaft. The stator is located so as to surround an outer periphery of the rotor. The rotor includes a rotor iron core including a plurality of rotor slots located at predetermined intervals in a circumferential direction and rotor bars inserted into the rotor slots. Rotor slits communicate with outer peripheral sides of the rotor slots. The rotor slits have a width ws in a circumferential direction. The width ws is smaller than a height hs in a radial direction of the rotor slit, and when a rated current is denoted as I1, a turn ratio (primary/secondary) is denoted as Tr, and a magnetic permeability in a vacuum is denoted as ?0, a relationship of ws>?0×I1×Tr/0.6 is met.

Abstract: A coil support structure including a coil spacer, a yoke spacer, and a support formed between the coil spacer and the yoke spacer. And the support has laterally protruding parts.

Abstract: A coil support structure including a coil spacer, a yoke spacer, and a support formed between the coil spacer and the yoke spacer. And the support has laterally protruding parts.

Abstract: A rotating electrical machine includes a housing having an approximately cylindrical shape; a stator and a rotor that are accommodated in the housing; and a cooling frame that is provided on an outer circumferential surface of the housing and circulates a first liquid refrigerant, in which the cooling frame has a partially cylindrical shape. By setting the cooling frame to have the partially cylindrical shape, it is possible to obtain cooling structure capable of obtaining a reduction in size and weight while securing the strength.

Abstract: An electrical rotating machine is provided with a salient-pole rotor, which is composed of magnetic field pole bodies integrally formed with a shaft and pole shoes constituting magnetic field pole heads. Each pole shoe is fixedly joined on the corresponding one of the magnetic field pole bodies with a plurality of bolts. Each pole shoe or its corresponding magnetic field pole body is provided with at least one protrusion or recess for restricting a conically-shaped compression domain in a compression domain that occurs in the pole shoe when the pole shoe is joined on the corresponding magnetic field pole body with the bolts.

Abstract: An electrical rotating machine is provided with a salient-pole rotor, which is composed of magnetic field pole bodies integrally formed with a shaft and pole shoes constituting magnetic field pole heads. Each pole shoe is fixedly joined on the corresponding one of the magnetic field pole bodies with a plurality of bolts. Each pole shoe or its corresponding magnetic field pole body is provided with at least one protrusion or recess for restricting a conically-shaped compression domain in a compression domain that occurs in the pole shoe when the pole shoe is joined on the corresponding magnetic field pole body with the bolts.

Abstract: A silicon wafer having a low concentration of carbon and a silicon wafer having a high concentration of carbon are joined and polished to prescribed thicknesses to form a semiconductor substrate according to the present invention.

Abstract: A silicon wafer having a low concentration of oxygen and a silicon wafer having a high concentration of oxygen are joined and polished to prescribed thicknesses to form a semiconductor substrate according to the present invention. A region formed of the wafer having a low concentration of oxygen is used as a region where an element is formed, and a region formed of the wafer having a high concentration of oxygen produces a gettering effect on metal impurities and defects. As a DZ layer having a low concentration of oxygen, a wafer manufactured by an MCZ method or a wafer manufactured by a CZ method is used after being heat-treated at high temperature to diffuse oxygen outward. In another example, a damage layer, a polycrystalline silicon layer, an amorphous silicon layer or the like is formed between a DZ layer and an IG layer.

Abstract: This invention discloses a method for contactless evaluation of characteristics of semiconductor wafers and devices. The method includes the steps of (a) continuously irradiating focused microwaves on a surface of a semiconductor specimen; (b) continuously receiving reflected microwaves reflected from said surface; (c) irradiating a focused laser beam pulse on the specimen, energy of the pulse being in excess of the band-gap energy of the semiconductor material; (d) measuring lifetime .tau..sub.m from the time-history of the characteristics of the reflected microwaves; and (e) calculating the surface recombination velocity S and bulk lifetime .tau..sub.b. The focused microwaves and focused laser beam can improve the resolution during measurement.