Abstract: Described herein is a topcoat paint composition having an acrylic resin (A) and a melamine resin (B). The acrylic resin (A), relative to 100 parts by mass thereof, contains 30-40 parts by mass of 2-hydroxyethyl methacrylate, 10-30 parts by mass of styrene and 25 parts by mass or more of 2-ethylhexyl acrylate, and does not contain, relative to 100 parts by mass of the acrylic resin (A), more than 5 parts by mass of caprolactone compound(s) and/or hydroxy group-containing (meth)acrylates constituted of 7 or more carbons. The content of acrylic resin (A), relative to 100 parts by mass of total resin solids of the topcoat paint composition, is 45 parts by mass or more. The content of melamine resin (B), which does not contain complete alkyl ether type melamine resin, relative to the acrylic resin (A), as resin solids ratio, is acrylic resin (A)/melamine resin (B)=50/50 to 80/20.

Abstract: Described herein is a topcoat paint composition having an acrylic resin (A) and a melamine resin (B). The acrylic resin (A), relative to 100 parts by mass thereof, contains 30-40 parts by mass of 2-hydroxyethyl methacrylate, 10-30 parts by mass of styrene and 25 parts by mass or more of 2-ethylhexyl acrylate, and does not contain, relative to 100 parts by mass of the acrylic resin (A), more than 5 parts by mass of caprolactone compound(s) and/or hydroxy group-containing (meth)acrylates constituted of 7 or more carbons. The content of acrylic resin (A), relative to 100 parts by mass of total resin solids of the topcoat paint composition, is 45 parts by mass or more. The content of melamine resin (B), which does not contain complete alkyl ether type melamine resin, relative to the acrylic resin (A), as resin solids ratio, is acrylic resin (A)/melamine resin (B)=50/50 to 80/20.

Abstract: Disclosed is a two-liquid type urethane paint composition having a main agent which includes a hydroxyl group-containing resin (A), a hydrolyzable ester compound (B) and an alcohol-based solvent (C); and a curing agent which includes a polyisocyanate compound (D). The composition is made by mixing together the main agent and the curing agent, wherein the (B) component and the (C) component are included in the main agent in amounts from 2 to 35 parts by mass as effective component of the hydrolyzable ester compound (B) and from 2 to 10 parts by mass of the alcohol-based solvent (C) per 100 parts by mass of solid fraction of the hydroxyl group-containing resin (A), and the hydroxyl groups of the hydroxyl group-containing resin (A) and the functional groups of the polyisocyanate compound (D) are mixed in proportions of from 0.5 to 1.5 as the mol ratio of NCO/OH.

Abstract: Programming of a plurality of mask ROMs having a common structure and formed on a semiconductor wafer is effected by an ion implantation for adjusting the threshold voltage of the memory transistors. The mask ROMs on the wafer is grouped in a plurality of groups arranged in point-symmetry or axisymmetry. During forming a photoresist pattern for each of the mask ROMs, a common alignment offset is assigned to the photoresist patterns of the mask ROMs in each group in the location of opening for ion implantation. Ion implantation is effected to the mask ROMs by using the photoresist patterns having respective alignment offsets in openings. During the ion implantation, the difference in incident angle of an ion beam between the positions on the wafer is compensated by the alignment offsets in the opening of the photoresist patterns.

Abstract: In a wet processing apparatus, an electrolytic cell, a first storing cell for storing anode active water of the electrolytic cell, a first processing cell for processing a target with the anode active water of the first storing cell, a second storing cell for storing cathode active water of the electrolytic cell, and a second processing cell for processing a target with the cathode active water of the second storing cell are provided. Also, a first reactivating feedback path is provided between the first processing cell and an anode region of the electrolytic cell, and a second reactivating feedback path is provided between the second processing cell and a cathode region of the electrolytic cell.