Abstract: A substrate processing apparatus includes a plasma processing chamber, a base arranged inside the plasma processing chamber, and an electrostatic chuck arranged on the base and having a substrate support surface and a ring support surface. The electrostatic chuck is configured to include a plurality of heat-transfer gas supply holes formed in the substrate support surface, an annular seal band formed on the substrate support surface around an outer periphery of the plurality of heat-transfer gas supply holes so as to surround the plurality of heat-transfer gas supply holes, and at least one first protrusion formed on the substrate support surface between a first heat-transfer gas supply hole closest to the seal band among the plurality of heat-transfer gas supply holes and the seal band.

Abstract: An object is to provide an electronic control component bracket that is less likely to cause a high acceleration (high-speed vibration). An electronic control component bracket 1 includes a bottom portion on which a plurality of elastic pieces configured to press a lower surface of an electronic control component upward are provided, and abutting stop portions configured to abut, from above, against the electronic control component that is pressed upward. The plurality of elastic pieces are provided such that, when vertical vibration is applied in a state in which the electronic control component is assembled, the amplitude of at least one elastic piece is larger than that of another elastic piece.

Abstract: An electronic control component bracket includes a bottom portion on which a plurality of elastic pieces configured to press a lower surface of an electronic control component upward are provided, and abutting stop portions configured to abut, from above, against the electronic control component that is pressed upward. The plurality of elastic pieces are all the same, all in plate width, plate thickness, plate length, and plate shape. Pressing positions of the plurality of elastic pieces at which the elastic pieces press the lower surface of the electronic control component are arranged such that, when projected in a vertical direction relative to a plane orthogonal to the vertical direction, the plurality of elastic pieces do not have rotational symmetry and line symmetry on the plane of projection so that support for the electronic control component provided by the plurality of elastic pieces are made imbalanced.

Abstract: A substrate support comprises an electrostatic chuck configured to support a substrate and an edge ring and a base configured to support the electrostatic chuck. The electrostatic chuck includes a first region having a first upper surface and configured to support a substrate placed on the first upper surface, a second region having a second upper surface and configured to support an edge ring placed on the second upper surface, a first electrode disposed in the first region and to which a DC voltage is applied, a second electrode disposed below the first electrode and to which a first bias power is supplied, a third electrode disposed below the second electrode and to which the first bias power is supplied and a first gas supply line disposed between the second electrode and the third electrode.

Abstract: An electrode catheter includes a catheter shaft and an electrode assembly and a distal-side bundling component disposed at least partially distal to the catheter shaft. The electrode assembly includes a plurality of spline portions each having a proximal end portion bundled by the catheter shaft and a distal end portion bundled by the distal-side bundling component. The plurality of spline portions includes, when viewed from a distal side in an axial direction of the catheter shaft, a counterclockwise spline portion extending counterclockwise from a side of the distal end portion toward a side of the proximal end portion and a clockwise spline portion extending clockwise from the side of the distal end portion side toward the side of the proximal end portion.

Abstract: There is a substrate processing apparatus comprising: a processing chamber; a substrate support disposed in the chamber; and a power supply configured to supply a radio frequency (RF) power to at least the substrate support, wherein the substrate support includes: an electrostatic chuck that is made of ceramic and holds a substrate by electrostatic attraction; a base that has a channel through which a heat exchange medium flows and supports the electrostatic chuck; a low linear expansion coefficient member disposed between the electrostatic chuck and the base; a heat transfer sheet disposed between the low linear expansion coefficient member and the base; a fixing part configured to fix the heat transfer sheet to the low linear expansion coefficient member; and a conductive member that is disposed between the low linear expansion coefficient member and the base and electrically connects the low linear expansion coefficient member and the base.

Abstract: Provided is an electronic control component bracket that does not allow an electronic control component such as an ECU to be easily detached even if an unexpected external force is applied to the electronic control component, in a case where the bracket is assembled with the electronic control component. When a case of the electronic control component is assembled with an electronic control component bracket , an upper end of an elastic extending portion is moved into a bottom wall portion side of a disengagement-preventing portion so as to be stored in a gap.

Abstract: A temperature regulator includes a first member, a channel, and a cavity. The first member has a first surface that is subjected to temperature control. The channel is along the first surface in the first member, and refrigerant flows in the channel. The cavity is provided in the first member adjacently to a flow rate change region of the channel. A flow rate of refrigerant in the flow rate change region is higher than a flow rate of refrigerant in another region of the channel.

Abstract: A wiring substrate includes an insulating layer including a first layer and a second layer, and a conductor layer including a metal film formed on a surface of the second layer of the insulating layer such that the conductor layer includes a conductor pattern. The first layer includes resin and first inorganic particles, the second layer includes resin and second inorganic particles at the content rate that is lower than the content rate of the first inorganic particles in the first layer, and the thickness of the first layer is 90% or more of the thickness of the insulating layer. The second layer of the insulating layer includes a composite layer having the thickness in the range of 0.1 to 0.3 ?m, and the composite layer includes part of the metal film in the conductor layer formed in gaps between the second inorganic particles and resin in the second layer.

Abstract: A substrate support disposed inside a plasma processing chamber includes a base electrically connected to at least one power supply, a first dielectric disposed on the base and having a substrate support surface, and a second dielectric disposed on the base to surround the first dielectric and having a ring support surface, wherein the first dielectric includes therein a first heat transfer gas diffusion space, a first electrode disposed above the first heat transfer gas diffusion space, and a conductor that electrically connects the first electrode and the base, and wherein the second dielectric includes therein a second heat transfer gas diffusion space, and a second electrode disposed above the second heat transfer gas diffusion space and electrically connected to a power supply that outputs a common voltage with the base.

Abstract: A retaining tool is to be arranged in a housing space of a packing container and has: an insertion portion into which a syringe containing a material storage container that stores a viscous material can be inserted in an upright posture; and a solid portion that is provided around the insertion portion and forms the insertion portion. The solid portion is formed from a first end portion at which the insertion portion is positioned in the direction in which the viscous material is inserted into the insertion portion to a second end portion that is on the opposite side from the first end portion; includes a non-crosslinked polyethylene foam; and prevents bubbling when the viscous material as frozen at 0° C. or below thaws. The present invention also provides a usage method for the retaining tool, a syringe transport tool set, and a transport method for a syringe.

Abstract: A valve device includes a cover and a valve. The cover is attached to be fixed to a mating part to which the cover is attached, and includes a cover top part and a leg part extending from an outer peripheral part of the cover top part toward a mating part side to be attached to the mating part at a distal end part in an extending direction, the leg part is one of a plurality of the leg parts that are intermittently disposed in a circumferential direction, and a release hole allowing a release of a fluid from an inside to an outside of the cover is disposed in each space between the leg parts that are adjacent to each other in the circumferential direction.

Abstract: The present invention provides a syringe transport method, packaging member, a method for using the packaging member, and a syringe transport tool set that has: surrounding member that is arranged in a housing space in a packing container, encircles a syringe comprising a material storage container that stores a viscous material, and comprises buffer member that cushions against external force applied to the syringe during transportation of the syringe; and a cold storage container comprising a content that can be arranged between the syringe and the buffer member in the housing space and which cools the syringe and a content storage container that houses the content. The thermal conductivity of the buffer member is no more than 0.022W/m·K. The melting point of the content is no more than ?30° C. The present invention uses a configuration other than vacuum heat insulation and prevents or suppresses excessive cooling of the viscous material.

Abstract: A method for manufacturing a cellulose derivative includes a step of preparing a low crystalline cellulose having a degree of crystallinity of 70% or less and a step of derivatizing the low crystalline cellulose described above.

Abstract: Objects are: to make a fixing structure in which an engagement part of a fixing member is inserted and fixed in a through hole of a plate-shaped member, into a structure in which the fixing member is easily detached from the through hole and is less likely to be damaged or broken when being detached; and to, in doing so, maintain the dustproof and waterproof performance, the molding processability, and the elasticity of a dish-like contact portion of the fixing member at the conventional level, and suppress a size increase. To attain these objects, in a fixing structure, arc-shaped bent portions are respectively formed at both ends of a dish-like contact portion which annularly contacts a through hole surrounding portion from a near side in an insertion direction, and are guide portions for a detachment jig to enter the inside of the dish-like contact portion in the fixing structure.

Abstract: A plasma processing apparatus includes a substrate support. The substrate support includes a base, an electrostatic chuck, a chuck electrode, and an electrode structure. The electrostatic chuck is disposed on the base and has a central region and an annular region. The chuck electrode is disposed in the central region. The electrode structure is disposed below the chuck electrode in the central region and is placed in an electrically floating state. The electrode structure includes a first electrode layer, a second electrode layer disposed below the first electrode layer, and one or more connectors that connect the first electrode layer and the second electrode layer. At least one bias power supply is electrically coupled to the substrate support.

Abstract: A catheter includes an elongated body, a distal end side of which is inserted into a body, and an electrode provided around an axis of the elongated body and expandable in a direction intersecting the axis. The electrode in an expanded state includes an intermediate portion at least partially including a portion in which element wires spread like a mesh, a proximal end portion located closer to a proximal end side of the elongated body than the intermediate portion and in which the element wires gather, and a distal end portion located closer to the distal end side than the intermediate portion and in which the element wires gather. The intermediate portion includes a maximum portion where an outer dimension of the electrode is maximized. The maximum portion is located closer to the proximal end side than a center of the electrode in an axial direction of the elongated body.

Abstract: Provided is a fixing member that can fix a base and a fixing target member such that the fixation between the base and the fixing target member can be released and formation of a gap between the base and the fixing target member is suppressed. The fixing member includes a shaft portion and an elastic piece formed integrally with the shaft portion. The shaft portion is provided so as to be movable between an advance position at which the distal end portion thereof is engageable with a hole of the fixing target member and a retraction position at which the engagement is released, in an assembled state to the base. The elastic piece biases the shaft portion to the advance position, and is elastically deformable so as to permit movement of the shaft portion to the retraction position.

Abstract: A plasma processing apparatus includes a plasma processing chamber and a substrate support disposed in the plasma processing chamber. The substrate support includes a ceramic member having a substrate supporting surface and a back surface, a chuck electrode layer, a bias electrode layer, a gas diffusion channel horizontally extending in the ceramic member and having a main path and branch paths branched from the main path, a gas inlet vertically extending from the back surface to the gas diffusion channel in the ceramic member, and gas outlets communicating with the gas diffusion channel. Each gas outlet has a cavity portion horizontally extending from at least one of the branch paths and a porous portion vertically extending from the cavity portion to the substrate supporting surface and filled with a ceramic porous material.

Abstract: A vehicle, including: a panel member provided at a vehicle body, the panel member opposing a wheelchair, which has boarded the vehicle, in a vehicle width direction; a front side securing member provided at the panel member, the front side securing member being caused to contact a front portion side of a handrim of the wheelchair or a front portion side of a wheel of the wheelchair; and a rear side securing member that presses a rear portion side of the handrim or a rear portion side of the wheel toward a vehicle body front side so as to push the front portion side of the handrim or the front portion side of the wheel against the front side securing member.