Patents by Inventor Makoto Miyazawa

Makoto Miyazawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040250665
    Abstract: An aspheric-surface processing method according to the present invention, uses a cutting apparatus including at least one turning tool movable in the same direction as the rotating axis of the work and is also movable in a direction perpendicular to the rotating axis of the work. This method includes moving the turning tool at a predetermined feed pitch in a fixed direction over at least a part of the work region extending from the center of the rotating axis of the work to a peripheral portion of the work and also moving the turning tool in another direction perpendicular to the rotating axis of the work in order to process the work for forming an axis-asymmetric aspheric surface.
    Type: Application
    Filed: February 18, 2004
    Publication date: December 16, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Makoto Miyazawa
  • Publication number: 20040231958
    Abstract: The present invention relates to a polishing jig for mounting a working object lens on a polishing apparatus that polishes the concave surface of the working object lens, a conveyor tray for exclusive use for conveying the polishing jig, and a conveying method and a conveying apparatus for conveying the polishing jig or the like with the working object lens held thereon to a working apparatus such as the polishing apparatus.
    Type: Application
    Filed: January 26, 2004
    Publication date: November 25, 2004
    Inventors: Makoto Miyazawa, Isao Karasawa, Yoshio Hori
  • Patent number: 6743486
    Abstract: Production information such as an edging mark 31 indicating a region of a lens remaining after edging and reference position marks 32 are depicted in a region, to be cut off by the edging, of a surface of a lens 10 for spectacles. Any production information does not remain on the finished lens 10 after the edging. A lens processing system 100 includes a reference position detecting apparatus (120 and 130) for detecting a reference position of a spectacle lens, and a marking apparatus (170, 160, 150 and 110) for depicting production information of the lens on a specific surface of the spectacle lens on the basis of the reference position information obtained by the reference position detecting apparatus (120 and 130).
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: June 1, 2004
    Assignee: Seiko Epson Corporation
    Inventor: Makoto Miyazawa
  • Publication number: 20040043710
    Abstract: A polisher for polishing a curved surface such as a concave surface of a spectacle lens has a structure in which a polishing pad 3 comprising water passing grooves 5 having a width W of 0.1 to 5 mm is adhered to a dome-shaped elastic base member 2. The polishing pad 3 is composed of a plurality of pads 31, and the water passing grooves 5 are formed at the gaps between the pads 31, whereby the width W of the water passing grooves 5 are made small. It is effective to make the pads 31 polygonal in shape. The polishing pad 3 covers the moving region 6 of the work 8 to be polished. The polishing pad 3 is adhered through a high-tack adhesive layer 4. A polishing method is adopted in which such a polisher 1 is used and the work 8 is polished by pressing the polishing pad 3 against the work 8, whereby the polishing pad 3 adhered to the elastic base member 2 can be prevented from being stripped by an end edge of the work 8, and generation of defective polish can be prevented.
    Type: Application
    Filed: June 23, 2003
    Publication date: March 4, 2004
    Inventor: Makoto Miyazawa
  • Publication number: 20020160690
    Abstract: A lens surface shape is created by a near-finish surface forming rough-cutting step of creating a near-finish surface shape analogous to a lens surface shape based on a prescription of a spectacle lens from a spectacle lens base material 11 by numerically controlled cutting, and a finish-cutting step of creating the lens surface shape based on the prescription of the spectacle lens from the near-finish surface shape by numerically controlled cutting. According to this method of producing a spectacle lens, all kinds of spectacle lenses including an inner surface progressive power lens can be produced with high productivity.
    Type: Application
    Filed: October 11, 2001
    Publication date: October 31, 2002
    Inventors: Makoto Miyazawa, Yoshinori Tabata, Takahiro Uchidani
  • Patent number: 5905009
    Abstract: A charge generation material for an electrophotographic photoconductor includes a titanyloxyphthalocyanine molecular aggregate. The titanyloxyphthalocyanine molecular aggregate contains between 0.006 to 1.000 water molecules per titanyloxyphthalocyanine molecule. The titanyloxyphthalocyanine molecular aggregate exhibits an X-ray diffraction spectrum, measured using CuK.alpha. radiation, having clear peaks at angles of 7.2.degree., 9.6.degree., 11.6.degree., 13.4.degree., 14.9.degree., 18.3.degree., 23.6.degree., 24.1.degree. and 27.3.degree., the peak at 9.6.degree. being the highest, the spectrum lacking a peak at 26.3.degree., and the angles being 2 .theta..+-.0.2.degree., where .theta. is a diffraction angle. A function-separation-type electrophotographic photoconductor includes the titanyloxyphthalocyanine molecular aggregate of the present invention in the charge generation layer.
    Type: Grant
    Filed: October 8, 1997
    Date of Patent: May 18, 1999
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Yoichi Nakamura, Kazumi Egota, Toshio Tsubota, Makoto Miyazawa
  • Patent number: 5812354
    Abstract: A semiconductor integrated circuit device communicates with an external device through signal terminals, and is powered through power terminals; protective circuits are respectively connected to the signal terminals for discharging static electric charge through a shared conductive line to the power terminal connected to a ground line, and a potential level of the semiconductor substrate is propagated through the shared conductive line to a detecting circuit for reversely biasing the semiconductor substrate at intervals; and an interrupting circuit discriminates isolating state of the power terminal from the ground line so as to cut off a current path between the shared conductive line and the detecting circuit.
    Type: Grant
    Filed: April 22, 1997
    Date of Patent: September 22, 1998
    Assignee: NEC Corporation
    Inventor: Makoto Miyazawa
  • Patent number: 5306842
    Abstract: A method for manufacturing a purified aromatic urethane. Aromatic urethanes are synthesized from a N,N'-disubstituted urea and an organic hydroxyl compound in a reaction medium. The organic hydroxyl compound and the primary aromatic amine side product which are present in the reaction mixture is distilled off and removed from the reaction mixture leaving a distillation bottom. The N,N'-disubstituted urea is separated and removed from the distillation bottom by solvent extraction of the aromatic urethane, and the aromatic urethane in the extract phase obtained in said solvent extraction is separated and purified.
    Type: Grant
    Filed: April 29, 1992
    Date of Patent: April 26, 1994
    Assignee: NKK Corporation
    Inventors: Takao Ikariya, Masanori Itagaki, Masatsugu Mizuguchi, Makoto Miyazawa, Sachiko Yamamoto
  • Patent number: 5130464
    Abstract: A method of manufacturing aromatic urethanes utilizes a urea production process wherein a primary aromatic amine, an aromatic nitro-compound and carbon monoxide are made to react together in the presence of a catalyst and solvents, to produce N,N'-disubstituted urea, the solvlent used in the urea production process consisting at least partly of an amide or oxygen-containing sulfur compound, and having the functions of stabilizing the catalyst and preventing it from separating out in a solution, and of increasing the activity of the catalyst, the quantity of the solvent being sufficient to permit it to fulfill these functions effectively. The method additionally includes an aromatic urethane production process wherein the N,N'-disubstituted urea produced is made to react with an organic compound containing hydroxyl groups, to produce a primary aromatic amine and aromatic urethane, the primary aromatic amine being separated to obtain the aromatic urethane.
    Type: Grant
    Filed: March 16, 1990
    Date of Patent: July 14, 1992
    Assignee: NKK Corporation
    Inventors: Takao Ikariya, Masanori Itagaki, Mikoto Iemoto, Masatsugu Mizuguchi, Tetsuo Hachiya, Tomomichi Nakamura, Makoto Miyazawa, Sachiko Yamamoto
  • Patent number: 4733285
    Abstract: An MOSIC is provided with an input and/or output protective circuit which includes a first semiconductor region formed in a semiconductor substrate with a PN junction and electrically coupled between an input or output terminal and a transistor to be protected and a second semiconductor region formed so as to surround the first region. The PN junction formed between the second region and the substrate is reverse-biased, whereby the second region absorbs carriers which are undesirably injected from the first region into the substrate in an electrical operation of the IC.
    Type: Grant
    Filed: July 24, 1985
    Date of Patent: March 22, 1988
    Assignee: NEC Corporation
    Inventors: Hiroshi Ishioka, Tohru Tsujide, Makoto Miyazawa
  • Patent number: 4025604
    Abstract: Powder and/or fine particles containing mainly oxides of iron or ferroalloys, which are used or generated in ironworks, steelworks, etc. are sieved to a grain size range between about 32 mesh and about 10mm and used as reduction catalyzer. A reactor is filled with said reduction catalyzer. Exhaust gas containing nitrogen oxides and with added ammonia is passed in contact with said reduction catalyzer through said reactor, while heating said reduction catalyzer to a temperature between about 300.degree. C and about 370.degree. C, whereby nitrogen oxides are removed from said exhaust gas by reduction. Said reduction catalyzer can be used as material for ironmaking, without requiring any further treatment, after use as catalyzer.
    Type: Grant
    Filed: December 16, 1974
    Date of Patent: May 24, 1977
    Assignee: Nippon Kokan Kabushiki Kaisha
    Inventors: Sanseki Moriguchi, Hiroshi Abe, Taisuke Nishida, Jyoichi Takenaka, Makoto Miyazawa, Sadayoshi Iwabuchi
  • Patent number: 3932585
    Abstract: A method of removing a nitrogen oxide from an exhaust containing the same which comprises preparing an absorbent solution by adding divalent copper ions alone or a mixture of the divalent copper ions and divalent manganese ions to an acid aqueous solution containing sulfites or acid sulfites of ammonium, alkaline metals, or alkaline earth metals or a mixture of two or more of these compounds; and introducing the plant exhaust into the absorbent solution to carry out reaction between the sulfite radical of the absorbent solution and the nitrogen oxides contained in the exhaust to reduce the nitrogen oxides to nitrogen gas.
    Type: Grant
    Filed: September 6, 1973
    Date of Patent: January 13, 1976
    Assignee: Nippon Kokan Kabushiki Kaisha
    Inventors: Sanseki Moriguchi, Hiroshi Abe, Kiyoshi Saito, Makoto Miyazawa