Patents by Inventor Makoto Morijiri

Makoto Morijiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4766009
    Abstract: A selective working method in which the surface to be worked of a workpiece is locally irradiated with energy beams and an electroless plating solution or an electroless etching solution is contacted with the irradiated workpiece surface, with the electroless plating solution or the electroless etching solution flowing continuously in the substantially same direction of as the direction of an irradiation of energy beams. The electroless plating of the electroless etching can be conducted selectively by this method. Above selective working method is best suited for the formation or correction (repair, filling up etc.) of micro-patterns on the workpiece such as metals, semi-conductors, insulators, etc.
    Type: Grant
    Filed: January 6, 1987
    Date of Patent: August 23, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Midori Imura, Makoto Morijiri, Masanobu Hanazono, Shinichi Kazui
  • Patent number: 4659587
    Abstract: In a selective electroless plating process suitable for formation and correction of a minute pattern by plating film, irradiation of the surface of a workpiece with a laser beam serves to selectively activate the surface of the workpiece to allow an electroless plating film to deposited on only the activated portions. The portion of the workpiece where plating is effected is irradiated with a radiation energy beam to form a damaged portion, which is contact with a plating bath during and/or after the irradiation to selectively from a plating film on the damaged portion. The portion of a workpiece where a pole as the connector part of a multilayer wiring board is to be formed is irradiated with a laser beam and allowed to have a pole selectively formed only thereon.
    Type: Grant
    Filed: October 10, 1985
    Date of Patent: April 21, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Midori Imura, Makoto Morijiri, Masanobu Hanazono, Shinichi Kazui, Youzi Miura, Hiroyuki Ogino
  • Patent number: 4592801
    Abstract: A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.
    Type: Grant
    Filed: August 9, 1984
    Date of Patent: June 3, 1986
    Assignee: Computer Basic Technology Research Association
    Inventors: Shinichi Hara, Shinji Narishige, Tsuneo Yoshinari, Mistuo Sato, Katsuya Mitsuoka, Makoto Morijiri, Masanobu Hanazono, Tetsuo Kobayashi
  • Patent number: 4543573
    Abstract: A display panel includes a pair of substrates arranged face to face with each other with a predetermined gap therebetween, at least a pair of electrodes each provided on a corresponding one of facing surfaces of the substrates, and a display substance provided between the electrodes. A picture element is made up of a pair of facing portions of the electrodes and a portion of the display substance situated between the facing portions. At least one of the electrodes is made up of a multiplicity of picture element electrodes formed of a transparent conductive film and juxtaposed to each other and a contact metal member for substantially making an electrical connection of a plurality of ones of the picture element electrodes. The contact metal member is made up of a first layer made of chromium or a chromium alloy and a second layer formed on the first layer and made of nickel or gold.
    Type: Grant
    Filed: March 30, 1982
    Date of Patent: September 24, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Moriaki Fuyama, Katsumi Tamura, Makoto Morijiri, Mamoru Sawahata, Hiroaki Hachino