Abstract: A process for preparing intermediate compound (VII), compound (VIII) and compound (XIV) which will be raw materials for the synthesis of a synthetic antibactrial compound, via compound (I) or compound (X) and then, compound (II), the compounds each being shown below; and novel compounds useful for the preparation.

Abstract: [Problem]Provision of a commercially advantageous method for producing an intermediate which is important for producing the antibacterial and which has a mother nucleus common to the antibacterial, and intermediates produced by such method.

Abstract: Provided are a technique for position-selectively introducing an amino group into a difluorobenzoic acid, a novel process for producing a quinolonecarboxylic acid derivative serving as an antibacterial agent, and intermediates in the production. The process comprises treating a compound represented by formula (6): with a base in a water-containing solvent.

Abstract: A process for preparing intermediate compound (VII), compound (VIII) and compound (XIV) which will be raw materials for the synthesis of a synthetic antibactrial compound, via compound (I) or compound (X) and then, compound (II), the compounds each being shown below; and novel compounds useful for the preparation.

Abstract: Disclosed is a catheter for penetrating a stenotic lesion occurred in a lumen in a human body, including:

Abstract: A process for preparing intermediate compound (VII), compound (VIII) and compound (XIV) which will be raw materials for the synthesis of a synthetic antibactrial compound, via compound (I) or compound (X) and then, compound (II), the compounds each being shown below; and novel compounds useful for the preparation.

Abstract: A metal film etching method etches selectively a metal film formed on a layer insulating film provided with viaholes so as to cover the surface of the layer insulating film and fill up the viaholes so that the metal film excluding portions there of filling up the viaholes are removed completely without forming a pit in the portions of the metal film filling up the viaholes. The metal film etching method uses a mixed reactive gas of a gas containing fluorine atoms, a gas containing chlorine atoms and oxygen gas.

Abstract: A method of preparing a patterned thin film resistor that is appropriately used in combination with semiconductor devices. The method comprises a thin film forming step comprising forming a thin film of a compound comprising at least one metal on an oxide film such as a silicon oxide film; a masking step comprising covering a desired area of the thin film by an organic material; a patterning step comprising converting to plasma a gas mixture comprising a fluorine compound gas and oxygen, and removing an area of the thin film, that is not covered by the organic material by exposing it to a gas containing activated fluorine by the plasma conversion; and a removing step comprising removing the organic material remaining on the desired area of the thin film.

Abstract: A multiplex transmission system, in which a node as a transmission node transmits data frame by frame to a transmission path, and a plurality of other nodes, as reception nodes, returns a reception acknowledgment signal to the transmission path upon proper reception of the frame of data. Each of the reception nodes which properly received the frame returns the reception acknowledgment signal specific thereto to that division of a reception acknowledgment signal area in the frame which corresponds to this node. Each node discriminates the success/failure of signal transmission, by comparing the information registered beforehand in its reception acknowledgment signal table with the information in the reception acknowledgment signal area. When the information of the reception acknowledgment signal table does not coincide with that of the reception acknowledgment signal area, the transmission node re-transmits the frame and the reception acknowledgment signal tables of all the nodes are updated.

Abstract: A halocyanoacetamide compound having the formula: ##STR1## wherein X is a halogen such as Cl, F, Br and I; Y represents a halogen such as chlorine, fluorine, bromine and iodine or hydrogen atom; andR represents a hydrogen atom or a lower alkyl group containing from 1 to 8 carbon atoms, is stabilized with an organic carboxylic acid or a diol.

Abstract: A halocyanoacetamide compound having the formula: ##STR1## wherein X is a halogen such as Cl, F, Br and I; Y represents a halogen such as chlorine, fluorine, bromine and iodine or hydrogen atom; andR represents a hydrogen atom or a lower alkyl group containing from 1 to 8 carbon atoms, is stabilized with an organic carboxylic acid or a diol.