Patents by Inventor Makoto Nishihara
Makoto Nishihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240145413Abstract: A semiconductor device includes a semiconductor chip including a substrate, a transistor provided on an upper surface of the substrate and having an input electrode to which a high frequency signal is input, an output electrode from which the high frequency signal is output, and a reference potential electrode to which a reference potential is supplied, and a metal pattern provided on the upper surface of the substrate and electrically connected to the reference potential electrode, a first capacitor including a first lower electrode provided on the metal pattern and electrically connected to the metal pattern, a first dielectric layer provided on the first lower electrode, and a first upper electrode provided on the first dielectric layer, and a first bonding wire electrically connecting the first upper electrode and a first electrode which is any one of the input electrode and the output electrode.Type: ApplicationFiled: September 11, 2023Publication date: May 2, 2024Applicant: Sumitomo Electric Device Innovations, Inc.Inventor: Makoto NISHIHARA
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Publication number: 20240082636Abstract: An exercise assisting apparatus 1 includes: a division unit 312 configured to divide sample motion information 3231 indicating motions of a sample person doing exercise into a plurality of pieces of motion element information 3235, according to regularity of the motions of the sample person; and a generation unit 314 configured to generate an inference model by causing a pre-trained model 322 to learn time-series antecedent dependency of the plurality of pieces of motion element information, the inference model inferring motions of a target person, based on target motion information 3211 indicating the motions of the target person doing exercise.Type: ApplicationFiled: March 25, 2021Publication date: March 14, 2024Applicant: NEC CorporationInventors: Makoto YASUKAWA, Kosuke NISHIHARA, Yuji OHNO
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Patent number: 9601307Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole.Type: GrantFiled: February 5, 2014Date of Patent: March 21, 2017Assignee: Hitachi High-Technologies CorporationInventors: Seiichiro Kanno, Masashi Fujita, Naoya Ishigaki, Makoto Nishihara, Kumiko Shimizu
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Publication number: 20150371814Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole.Type: ApplicationFiled: February 5, 2014Publication date: December 24, 2015Inventors: Seiichiro KANNO, Masashi FUJITA, Naoya ISHIGAKI, Makoto NISHIHARA, Kumiko SHIMIZU
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Patent number: 9202665Abstract: Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam. After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement. The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.Type: GrantFiled: November 30, 2011Date of Patent: December 1, 2015Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Matsui, Osamu Komuro, Makoto Nishihara, Zhaohui Cheng
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Patent number: 9105446Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.Type: GrantFiled: January 28, 2013Date of Patent: August 11, 2015Assignee: Hitachi High-Technologies CorporationInventors: Yasushi Ebizuka, Seiichiro Kanno, Makoto Nishihara, Masashi Fujita
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Publication number: 20150097123Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.Type: ApplicationFiled: January 28, 2013Publication date: April 9, 2015Inventors: Yasushi Ebizuka, Seiichiro Kanno, Makoto Nishihara, Masashi Fujita
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Publication number: 20140027635Abstract: Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam. After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement. The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.Type: ApplicationFiled: November 30, 2011Publication date: January 30, 2014Inventors: Hiroyuki Matsui, Osamu Komuro, Makoto Nishihara, Zhaohui Cheng
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Patent number: 8338781Abstract: In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.Type: GrantFiled: April 4, 2011Date of Patent: December 25, 2012Assignee: Hitachi High-Technologies CorporationInventors: Yuko Sasaki, Makoto Ezumi, Makoto Nishihara, Tsutomu Kawai, Toshiaki Yanokura
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Patent number: 8180140Abstract: To create a template for use in image recognition based on design data, luminance information is set for each area in the template based on the information regarding the region defined by the template. The luminance information may be set based on material information, pattern size information of a pattern arranged in the region defined by the template, and layer information of the region defined by the template. Alternatively, luminance information may be set based on material information, setup conditions of the scanning electron microscope, and pattern outline information of a pattern arranged in the region defined by the template.Type: GrantFiled: March 6, 2009Date of Patent: May 15, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoungmo Yang, Makoto Nishihara, Shunsuke Koshihara
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Publication number: 20110286685Abstract: Provided are an image formation method and a charged particle beam device which can accurately measure a plurality of objects to be measured and contained in an image by executing a small number of scans. For this, a scan line is set in a direction other than the edge direction of a plurality of objects to be measured and contained in the image view field and the charged particle beam is scanned according to the setting. Provided also are a method and a device for setting a scan line direction in an appropriate direction not affected by the pattern deformation or the like. For this, a direction of disconnection between two patterns to be connected is obtained according to the deformation of the two patterns and a scan line is set in the direction determined according to the one of more directions of disconnection.Type: ApplicationFiled: October 15, 2009Publication date: November 24, 2011Inventors: Makoto Nishihara, Kyoungmo Yang, Yoshihiro Oyabu
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Publication number: 20110174975Abstract: In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.Type: ApplicationFiled: April 4, 2011Publication date: July 21, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Yuko SASAKI, Makoto Ezumi, Makoto Nishihara, Tsutomu Kawai, Toshiaki Yanokura
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Patent number: 7935925Abstract: In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.Type: GrantFiled: August 8, 2007Date of Patent: May 3, 2011Assignee: Hitachi High-Technologies CorporationInventors: Yuko Sasaki, Makoto Ezumi, Makoto Nishihara, Tsutomu Kawai, Toshiaki Yanokura
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Publication number: 20090304286Abstract: An object of the present invention is to maintain the ease with which a template is created based on design data without acquiring an actual image, which is achieved by providing the template with equivalent information contained by a template used for image recognition that involves same-type image comparison, and to improve image recognition performance by increasing the matching rate between a template and an actual image. To achieve the above object, the present invention provides a method, apparatus, and program for creating based on design data a template that is used for image recognition, wherein luminance information is set for each area in the template based on the material information of the region defined by the template.Type: ApplicationFiled: March 6, 2009Publication date: December 10, 2009Inventors: Kyoungmo Yang, Makoto Nishihara, Shunsuke Koshihara
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Publication number: 20080073528Abstract: In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objects inside a scan position deflectable region and on the basis of a shift of a target object at a scan location after deflection, the deflection amount at the scan location is corrected.Type: ApplicationFiled: August 8, 2007Publication date: March 27, 2008Inventors: Yuko Sasaki, Makoto Ezumi, Makoto Nishihara, Tsutomu Kawai, Toshiaki Yanokura
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Publication number: 20030169212Abstract: In order to arbitrarily and freely change a display position and a display direction of a sub display on a housing, in a portable electronic device having a main display and an operation unit provided on a front face of a housing accommodating system constituting elements therein, a sub display is rotatably supported in an accommodation unit provided at an upper edge of the housing excluding the front face, and a display screen of the sub display is supported so as to have both a readable state in which the display screen faces toward outside the housing, that is, toward the front face, a top surface and a back face, and a not-readable state in which the display screen faces toward inside the housing being inside the accommodation unit.Type: ApplicationFiled: January 30, 2003Publication date: September 11, 2003Inventor: Makoto Nishihara