Patents by Inventor Makoto Oomiya

Makoto Oomiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for correcting pattern film on a semiconductor substrate
    Publication number: 20050178752
    Abstract: In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
    Type: Application
    Filed: April 5, 2005
    Publication date: August 18, 2005
    Inventors: Yukio Morishige, Makoto Oomiya
  • Method and device for correcting pattern film on a semiconductor substrate
    Patent number: 6890387
    Abstract: In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: May 10, 2005
    Assignee: Laserfront Technologies, Inc.
    Inventors: Yukio Morishige, Makoto Oomiya
  • Method and device for correcting pattern film on a semiconductor substrate
    Publication number: 20020047095
    Abstract: In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
    Type: Application
    Filed: October 19, 2001
    Publication date: April 25, 2002
    Applicant: NEC CORPORATION
    Inventors: Yukio Morishige, Makoto Oomiya