Patents by Inventor Makoto Senoue

Makoto Senoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for treating a waste gas
    Patent number: 4673558
    Abstract: A method for treating a waste gas containing a fluorine component and/or a chlorine component, which comprises contacting the waste gas with magnesium oxide particles having a specific surface area of from 100 to 200 m.sup.2 /g.
    Type: Grant
    Filed: September 4, 1985
    Date of Patent: June 16, 1987
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Makoto Senoue, Kunihiko Terase, Keiichi Nakaya
  • Dry-etching process
    Patent number: 4581101
    Abstract: A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.
    Type: Grant
    Filed: October 4, 1984
    Date of Patent: April 8, 1986
    Assignees: Asahi Glass Company Ltd., Kokusai Electric Co., Ltd.
    Inventors: Makoto Senoue, Kunihiko Terase, Shinya Iida, Hideo Komatsu