Patents by Inventor Makoto Shibamiya

Makoto Shibamiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7247921
    Abstract: A semiconductor apparatus includes a semiconductor substrate having a device region and a periphery region surrounding the device region; a semiconductor device provided in the device region of the semiconductor substrate; a first electrode pad provided on the semiconductor substrate; a second electrode pad provided on the semiconductor substrate; a strip-like, first conductivity type semiconductor pattern; and a strip-like, second conductivity type semiconductor pattern. The strip-like, first conductivity type semiconductor pattern extends in the periphery region of the semiconductor substrate, and the first electrode pad is electrically connected to one end of the first conductivity type semiconductor pattern. The strip-like, second conductivity type semiconductor pattern constitutes a p-n junction in conjunction with the first conductivity type semiconductor pattern. The first and second electrode pads are electrically connected to both ends of the second conductivity type semiconductor pattern.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: July 24, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Sugiura, Yasuhiko Kuriyama, Toru Sugiyama, Yoshikazu Tanabe, Makoto Shibamiya
  • Patent number: 7084708
    Abstract: A high-frequency amplification device includes a high-frequency amplifier including input and output sections, a first capacitor including first and second electrodes, and a first insulation film interposed therebetween. The first electrode is connected to the output section via a first inductor, and the second electrode is grounded. The amplification device further comprises a second capacitor including third and fourth electrodes and a second insulation film interposed therebetween. The third electrode is formed of a material substantially identical to that of the first electrode, and the fourth electrode is formed of a material substantially identical to that of the second electrode. The second insulation film is formed of a material substantially identical to that of the first insulation film and has a thickness substantially identical to that of the first insulation film.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: August 1, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Sugiura, Makoto Shibamiya, Yasuhiko Kuriyama, Toru Sugiyama, Yoshikazu Tanabe
  • Publication number: 20050275076
    Abstract: A semiconductor apparatus comprising: a semiconductor substrate having a device region and a periphery region surrounding the device region; a semiconductor device provided in the device region of the semiconductor substrate; a first electrode pad provided on the semiconductor substrate; a second electrode pad provided on the semiconductor substrate; a strip-like, first conductivity type semiconductor pattern; and a strip-like, second conductivity type semiconductor pattern. The strip-like, first conductivity type semiconductor pattern extends in the periphery region of the semiconductor substrate, and the first electrode pad is electrically connected to one end of the first conductivity type semiconductor pattern. The strip-like, second conductivity type semiconductor pattern constitutes a p-n junction in conjunction with the first conductivity type semiconductor pattern. The first and second electrode pads are electrically connected to both ends of the second conductivity type semiconductor pattern.
    Type: Application
    Filed: June 9, 2005
    Publication date: December 15, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masayuki Sugiura, Yasuhiko Kuriyama, Toru Sugiyama, Yoshikazu Tanabe, Makoto Shibamiya
  • Publication number: 20050236689
    Abstract: A high-frequency amplification device includes a high-frequency amplifier including input and output sections, a first capacitor including first and second electrodes, and a first insulation film interposed therebetween. The first electrode is connected to the output section via a first inductor, and the second electrode is grounded. The amplification device further comprises a second capacitor including third and fourth electrodes and a second insulation film interposed therebetween. The third electrode is formed of a material substantially identical to that of the first electrode, and the fourth electrode is formed of a material substantially identical to that of the second electrode. The second insulation film is formed of a material substantially identical to that of the first insulation film and has a thickness substantially identical to that of the first insulation film.
    Type: Application
    Filed: July 12, 2004
    Publication date: October 27, 2005
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Sugiura, Makoto Shibamiya, Yasuhiko Kuriyama, Toru Sugiyama, Yoshikazu Tanabe