Patents by Inventor Makoto Sukegawa
Makoto Sukegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10340172Abstract: This semiconductor wafer surface protection film has a substrate layer A, an adhesive absorption layer B, and adhesive surface layer C, in the stated order. The adhesive absorption layer B comprises an adhesive composition containing a thermoset resin b1, said adhesive absorption layer B having a minimum value G?bmin of the storage elastic modulus G?b in the range of 25° C. to less than 250° C. of 0.001 MPa to less than 0.1 MPa, a storage elastic modulus G?b250 at 250° C. of 0.005 MPa or above, and a temperature at which G?bmin is exhibited of 50-150° C. The adhesive surface layer C has a minimum value G?cmin of the storage elastic modulus G?c in the range of 25° C. to less than 250° C. of 0.03 MPa.Type: GrantFiled: July 1, 2016Date of Patent: July 2, 2019Assignee: MITSUI CHEMICALS TOHCELLO, INC.Inventors: Jun Kamada, Noboru Kawasaki, Shinichi Usugi, Makoto Sukegawa, Jin Kinoshita, Kouji Igarashi, Akimitsu Morimoto
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Publication number: 20180197764Abstract: This semiconductor wafer surface protection film has a substrate layer A, an adhesive absorption layer B, and adhesive surface layer C, in the stated order. The adhesive absorption layer B comprises an adhesive composition containing a thermoset resin b1, said adhesive absorption layer B having a minimum value G?bmin of the storage elastic modulus G?b in the range of 25° C. to less than 250° C. of 0.001 MPa to less than 0.1 MPa, a storage elastic modulus G?b250 at 250° C. of 0.005 MPa or above, and a temperature at which G?bmin is exhibited of 50-150° C. The adhesive surface layer C has a minimum value G?cmin of the storage elastic modulus G?c in the range of 25° C. to less than 250° C. of 0.03 MPa.Type: ApplicationFiled: July 1, 2016Publication date: July 12, 2018Applicant: MITSUI CHEMICALS TOHCELLO, INC.Inventors: Jun KAMADA, Noboru KAWASAKI, Shinichi USUGI, Makoto SUKEGAWA, Jin KINOSHITA, Kouji IGARASHI, Akimitsu MORIMOTO
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Patent number: 7928180Abstract: The problem of the invention is to provide a novel biodegradable polymer without water solubility (hygroscopicity), but with moldability and excellent water disintegratability and biodegradability, a production method thereof, a molded product thereof and applications thereof. The biodegradable polymer of the invention is a biodegradable polymer having one or more imine bonds within a molecule, characterized in that the imine bond constitutes part of a main chain structure of the biodegradable polymer. The biodegradable polymer preferably comprises a biodegradable unit and an imine unit having one or more imine bonds and has a chemical structure, in which the biodegradable units are linked by the imine unit.Type: GrantFiled: June 28, 2006Date of Patent: April 19, 2011Assignee: Mitsui Chemicals, Inc.Inventors: Manabu Shimoda, Tomoyuki Kawabata, Tadahito Nobori, Makoto Sukegawa
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Publication number: 20090142982Abstract: The problem of the invention is to provide a novel biodegradable polymer without water solubility (hygroscopicity), but with moldability and excellent water disintegratability and biodegradability, a production method thereof, a molded product thereof and applications thereof. The biodegradable polymer of the invention is a biodegradable polymer having one or more imine bonds within a molecule, characterized in that the imine bond constitutes part of a main chain structure of the biodegradable polymer. The biodegradable polymer preferably comprises a biodegradable unit and an imine unit having one or more imine bonds and has a chemical structure, in which the biodegradable units are linked by the imine unit.Type: ApplicationFiled: June 28, 2006Publication date: June 4, 2009Applicant: Mitsui Chemicals Inc.Inventors: Manabu Shimoda, Tomoyuki Kawabata, Tadahito Nobori, Makoto Sukegawa
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Patent number: 6657041Abstract: A production process of high molecular weight polysuccinimide having a weight average molecular weight of 40,000 or higher is disclosed, which comprises the following steps: 1) mixing and heating aspartic acid and an acidic catalyst to produce a liquid, low molecular weight polymer mixture, 2) separating the acidic catalyst to appropriate extent from the liquid, low molecular weight polymer mixture, thereby directly changing a polymer-containing phase from a liquid phase into a solid phase to produce a solid, low molecular weight polymer mixture, and 3) conducting solid-state polymerization on the thus-obtained solid, low molecular weight polymer mixture. This process can be practiced in a simple apparatus, and is free of problems such as formation of a highly viscous phase, excessive formation of foam, and formation of a reaction mixture into coherent mass.Type: GrantFiled: June 18, 2001Date of Patent: December 2, 2003Assignee: Mitsui Chemicals, Inc.Inventors: Katsuhiko Machida, Susumu Fukawa, Shinji Ogawa, Toshio Katoh, Makoto Sukegawa, Yoshihiro Irizato
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Patent number: 6346569Abstract: A process is disclosed for producing with good productivity a cross-linked polyaspartic acid resin having biodegradability and high water absorbency. The process features inclusion of one of the following steps: (a) a polysuccinimide, which has been brought into a dispersed state by a dispersant, and a cross-linking agent are reacted to produce the cross-linked polyaspartic acid resin; (b) imide rings of a cross-linked polysuccinimide are subjected to a hydrolysis reaction while controlling a swelling degree of a resulting gel, whereby the cross-linked polyaspartic acid resin is produced; and (c) a gel of a cross-linked polysuccinimide, which has been obtained by reacting a cross-linking agent to a solution of a polysuccinimide in an organic solvent, is disintegrated to subject imide rings of the cross-linked polysuccinimide to a hydrolysis reaction, so that the cross-linked polyaspartic acid resin is produced.Type: GrantFiled: February 28, 2000Date of Patent: February 12, 2002Assignee: Mitsui Chemicals, Inc.Inventors: Yoshihiro Irizato, Makoto Sukegawa, Toshio Katoh, Hiroaki Tamatani, Akinori Nagatomo, Masaru Wada
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Patent number: 6072024Abstract: A process is disclosed for producing with good productivity a cross-linked polyaspartic acid resin having biodegradability and high water absorbency. The process features inclusion of one of the following steps: (a) a polysuccinimide, which has been brought into a dispersed state by a dispersant, and a cross-linking agent are reacted to produce the cross-linked polyaspartic acid resin; (b) imide rings of a cross-linked polysuccinimide are subjected to a hydrolysis reaction while controlling a swelling degree of a resulting gel, whereby the cross-linked polyaspartic acid resin is produced; and (c) a gel of a cross-linked polysuccinimide, which has been obtained by reacting a cross-linking agent to a solution of a polysuccinimide in an organic solvent, is disintegrated to subject imide rings of the cross-linked polysuccinimide to a hydrolysis reaction, so that the cross-linked polyaspartic acid resin is produced.Type: GrantFiled: March 17, 1998Date of Patent: June 6, 2000Assignee: Mitsui Chemicals, Inc.Inventors: Yoshihiro Irizato, Makoto Sukegawa, Toshio Katoh, Hiroaki Tamatani, Akinori Nagatomo, Masaru Wada
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Patent number: 5986042Abstract: A cross-linked polymer containing, in its molecule, recurring units represented by the following formula (1), and having biodegradability and high water-absorbency: ##STR1## wherein R.sub.1 is a pendant group having at least one functional group selected from the group consisting of acidic groups and salts thereof, a glycino group and salts thereof, cationic groups and betaine groups; X.sub.1 is NH, NR.sub.1 ', R.sub.1 ' being an alkyl, aralkyl or aryl group, O or S; and n.sub.1 is 1 or 2.Type: GrantFiled: January 27, 1998Date of Patent: November 16, 1999Assignee: Mitsui Chemicals, Inc.Inventors: Yoshihiro Irizato, Makoto Sukegawa, Toshio Katoh, Hiroaki Tamatani
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Patent number: 5686066Abstract: Disclosed are polymers (polyaspartic acid Zwitterionic derivatives) containing, in the molecule, 1 mol % or more of at least one repeating unit selected from the group consisting of repeating units represented by the following formulas (1) and (2). ##STR1## These polymers are useful in the preparation of hair-treating compositions and cosmetic compositions having excellent hairdressing properties and good biocompatibility.Type: GrantFiled: September 30, 1996Date of Patent: November 11, 1997Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Yukiko Harada, Hosei Shinoda, Makoto Sukegawa, Hiroaki Tamatani
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Patent number: 5387485Abstract: A phase shift photomask for forming a fine-line pattern with high dimensional accuracy even at different focus positions. The phase shift photomask has a transparent substrate (1) of quartz, for example, and a light-shielding film (2) of chromium, for example, provided on the substrate (1). The light-shielding film (2) is partially removed to form a first opening pattern (4a) and a second opening pattern (4b) with a very small width which is annularly provided in a peripheral region adjacent to the first opening pattern (4a). The light-shielding film (2c) is left in each of the four corners of the second opening pattern (4b). In addition, a phase shifter layer 3 is provided over either of the first or second opening patterns (4a, 4b).Type: GrantFiled: November 29, 1993Date of Patent: February 7, 1995Assignee: Dai Nippon Printing Co., Ltd.Inventors: Makoto Sukegawa, Naoya Hayashi