Patents by Inventor Makoto TAKADO

Makoto TAKADO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9563209
    Abstract: A raw material gas supply method for use in a film forming apparatus which forms a film on a substrate, includes supplying a carrier gas to a gas phase zone defined inside a raw material container accommodating a liquid or solid raw material, vaporizing the raw material, supplying a raw material gas containing the vaporized raw material from the raw material container to the film forming apparatus via a raw material gas supply path, measuring a flow rate of the vaporized raw material flowing through the raw material gas supply path, comparing the flow rate of the vaporized raw material obtained by the flow rate measurement unit with a predetermined target value, and controlling an internal pressure of the raw material container to be increased when the flow rate is higher than the predetermined target value, and to be decreased when the is lower than the predetermined target value.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: February 7, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsuya Inoue, Makoto Takado
  • Publication number: 20150140694
    Abstract: A gas supply device for intermittently supplying raw material gas into a film forming process unit that includes a raw material container for accommodating a raw material, a carrier gas supply unit for supplying carrier gas to evaporate the raw material, a raw material gas supply path for supplying the raw material gas and the carrier gas into the film forming process unit, a flow rate detector, a flow rate regulating valve, a raw material supply and block unit for supplying and blocking the raw material gas into the film forming process unit, and a control unit for outputting a control signal for intermittently supplying the raw material gas into the film forming process unit.
    Type: Application
    Filed: November 20, 2014
    Publication date: May 21, 2015
    Inventors: Mitsuya INOUE, Makoto TAKADO
  • Publication number: 20140290752
    Abstract: A processing method is provided in which an object to be processed is processed within a processing container connected to a gas supply system, an exhaust system and an opening degree variable valve by using a processing gas in a plurality of sequential processing steps. The processing method includes: an acquisition process for acquiring an opening degree of the opening degree variable valve corresponding to a target pressure value within the processing container under a predetermined processing condition for at least one of the plurality of sequential processing steps; and an execution process for executing the at least one of the plurality of sequential processing steps for which the opening degree has been acquired by the acquisition process with the opening degree.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 2, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Hiroyuki Matsuura, Nobuyuki Hirota, Makoto Takado
  • Publication number: 20140209022
    Abstract: Provided is a raw material gas supply device for use in a film forming apparatus, which includes: a raw material container configured to accommodate a solid raw material; a carrier gas supply unit configured to supply a carrier gas to the container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material; a pressure control unit configured to control an internal pressure of the container; and a control unit configured to control the pressure control unit to increase the internal pressure of the container when the measured flow rate of the vaporized raw material is higher than a predetermined target value, and to decrease the internal pressure when the measured flow rate is lower than the target value.
    Type: Application
    Filed: January 30, 2014
    Publication date: July 31, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Mitsuya INOUE, Makoto TAKADO
  • Publication number: 20140209021
    Abstract: Provided is a raw material gas supply device which includes: a raw material container; a carrier gas supply unit configured to supply a carrier gas into the container via a carrier gas flow path; a first flow rate measurement unit configured to measure a flow rate of the carrier gas flowing therethrough and output the same as a first flow rate measurement value; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material into a film forming apparatus; a second flow rate measurement unit configured to measure a flow rate of the raw material gas flowing therethrough and output the same as a second flow rate measurement value; and a flow rate calculation unit configured to calculate a difference between the first and second flow rate measurement values and to convert the difference into a vaporization flow rate of the raw material.
    Type: Application
    Filed: January 29, 2014
    Publication date: July 31, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Mitsuya INOUE, Makoto TAKADO, Atsushi ANDO