Patents by Inventor Maksim Zalkovskij

Maksim Zalkovskij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240111076
    Abstract: Metastructures having meta-atoms composed of a high refractive index material are described, as are methods for manufacturing the metastructures. Intermediate wafers that can be produced during the methods also are described.
    Type: Application
    Filed: April 4, 2022
    Publication date: April 4, 2024
    Inventors: Maksim Zalkovskij, Brian Bilenberg
  • Publication number: 20230375748
    Abstract: An apparatus includes an optical element that has an optical metasurface including meta-atoms. In some instances, at least some of the meta-atoms have a first height and others of the meta-atoms have a second height that differs from the first height. In some instances, each meta-atom has a cross-section composed of a first metamaterial surrounded laterally by a second different metamaterial. Techniques for manufacturing such optical elements also are disclosed.
    Type: Application
    Filed: October 7, 2021
    Publication date: November 23, 2023
    Inventors: Maksim Zalkovskij, Mark Allen Moxey
  • Publication number: 20230367036
    Abstract: The present disclosure describes metastructure optical elements, assemblies, and methods of their manufacture. In some implementations, a metastructure optical element includes a first grouping of meta-atoms having a first etch characteristic. The first grouping of meta-atoms is composed of a first etched stratum. The metastructure optical element further includes a second grouping of meta-atoms having a second etch characteristic. The second grouping of meta-atoms is composed of a second etched stratum and an etched optical etch-deceleration layer. The second etched stratum is disposed on the etched optical etch-deceleration layer, and the etch-deceleration layer is disposed on a substrate.
    Type: Application
    Filed: September 15, 2021
    Publication date: November 16, 2023
    Inventor: Maksim ZALKOVSKIJ
  • Publication number: 20230333288
    Abstract: The present disclosure describes techniques that, in some instances, can help reduce stress and potential damage during the manufacture of optical elements such as those that include a metastructure formed by imprinting. In one aspect, a method of manufacturing an optical element includes imprinting a stamp into a polymeric material on a substrate, wherein the stamp includes first projections corresponding to an active area of the stamp for formation of meta-atoms in the polymeric material. The stamp further includes a protective structure laterally surrounding the first projections. The protective structure includes at least one additional projection extending in parallel to the first projections. The method includes removing the stamp from the polymeric material, thereby forming openings in the polymeric material in positions corresponding to the first projections and in one or more positions corresponding to the at least one additional projection.
    Type: Application
    Filed: September 17, 2021
    Publication date: October 19, 2023
    Inventors: Maksim Zalkovskij, Jesper Fly Hansen, Tobias Senn, Brian Bilenberg
  • Publication number: 20230314932
    Abstract: The disclosure describes optical elements including pseudorandom-shaped meta-atoms as well as related methods of manufacture. In some implementations, a method includes patterning a resist layer to form a pattern of features in the resist layer. The resist layer is disposed on a substrate that includes an optical sublayer disposed on a support. The substrate further includes a hard mask sublayer disposed on the optical sublayer. The method includes performing a first oxygen plasma etch to impart a pseudorandom shape to the features in the resist layer, and subsequently performing a plurality of etching operations to cause the pseudorandom-shaped features to be transferred into the optical sublayer of the substrate.
    Type: Application
    Filed: March 13, 2023
    Publication date: October 5, 2023
    Inventor: Maksim Zalkovskij
  • Publication number: 20230228910
    Abstract: Methods of manufacturing an optical device can include, in some implementations, providing a substrate having a first polymeric layer on a surface of the substrate and a second polymeric layer on the first polymeric layer, forming first openings in the second polymeric layer to define an etch mask composed of material of the second polymeric layer, and etching to form second openings in the first polymeric layer, wherein locations of the second openings are defined by the etch mask. A material is deposited in the second openings to form meta-atoms of a first metastructure, wherein adjacent ones of the meta-atoms are separated from one another by polymeric material of the first polymeric layer. Optical devices including metastructures can be formed, where meta-atoms of the metastructure have a relatively high aspect ratio.
    Type: Application
    Filed: June 16, 2021
    Publication date: July 20, 2023
    Inventors: Jesper Fly Hansen, Villads Egede Johansen, Maksim Zalkovskij, Brian Bilenberg, James Eilertsen
  • Publication number: 20230194757
    Abstract: Manufacturing an optical device includes providing a substrate (102) having a polymeric layer (104) on a surface of the substrate, forming openings in the polymeric layer, and depositing a material in the openings to form meta-atoms (114, 214) of a first metastructure. Adjacent ones of the meta-atoms are separated from one another by polymeric material of the polymeric layer. Optical devices that include one or more metastructures in which meta-atoms are separated from one another by polymeric material are described, as are modules that incorporate the optical devices.
    Type: Application
    Filed: May 17, 2021
    Publication date: June 22, 2023
    Inventors: Jesper Fly Hansen, Villads Egede Johansen, Maksim Zalkovskij, Brian Bilenberg, James Eilertsen