Patents by Inventor Maksym Kompaniiets

Maksym Kompaniiets has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING FOR IMPROVED IMAGE CONTRAST
    Publication number: 20240128051
    Abstract: A multi-beam charged particle system and a method of operating a multi-beam charged particle system can provide improved image contrast. The multi-beam charged particle system comprises a filter element or an active array element in a detection system, which can provide improved, anisotropic image contrast. The disclosure can be applied for applications of multi-beam charged particle system, where higher requirements on beam uniformity and throughput may be relevant.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 18, 2024
    Inventors: Dirk Zeidler, Bjoern Miksch, Maksym Kompaniiets
  • Apparatus and method for removing a single particulate from a substrate
    Patent number: 11886126
    Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: January 30, 2024
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets
  • APPARATUS AND METHOD FOR REMOVING A SINGLE PARTICULATE FROM A SUBSTRATE
    Publication number: 20220011682
    Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.
    Type: Application
    Filed: July 7, 2021
    Publication date: January 13, 2022
    Inventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets