Patents by Inventor Malakhi NOKED

Malakhi NOKED has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230343934
    Abstract: Some exemplary embodiments of the invention relate to performing atomic layer deposition (ALD) or molecular layer deposition (MLD) of a volatile organo silyl lithium compound and ozone on a substrate. According to various exemplary embodiments of the invention the volatile organo silyl lithium compound includes SiLi2tBuMe and/or tBuMe2SiLi and/or tBuMe2SiNa and/or SiLi3Et and/or Alk3GeLi and/or [(Alk3Si)4Al]Li and/or (NMe2)(tBu)2SiLi and/or tBuMe2SiLi-TMEDA and/or SiLi+TMA2tBuMe. Resultant coated products and their uses are also disclosed.
    Type: Application
    Filed: February 4, 2021
    Publication date: October 26, 2023
    Inventors: Malakhi NOKED, Yitzhak APELOIG, Yosi KRATISH, Dmitry BRAVO-ZHIVOTOVSKII, Rosy SHARMA
  • Patent number: 10826065
    Abstract: A protection layer is formed on a highly-reactive substantially-pure metal anode to a thickness of between 1 nm and 200 nm, inclusive, using atomic layer deposition (ALD). The ALD protection layer allows the conduction of ions of the metal of the anode therethrough but suppresses electron transport therethrough. The ALD protection layer may also be effective to inhibit passage of air and/or water therethrough. The ALD protection layer can allow more relaxed purity requirements for subsequent battery assembly, electrolyte specifications, and/or cathode gas purity. Fabrication methods for the protection layers, protected metal anodes, and systems and devices incorporating such protected metal anodes are also disclosed herein.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: November 3, 2020
    Assignee: University of Maryland, College Park
    Inventors: Alexander C. Kozen, Marshall A. Schroeder, Gary W. Rubloff, Liangbing Hu, Malakhi Noked, Sang Bok Lee
  • Publication number: 20170263935
    Abstract: A protection layer is formed on a highly-reactive substantially-pure metal anode to a thickness of between 1 nm and 200 nm, inclusive, using atomic layer deposition (ALD). The ALD protection layer allows the conduction of ions of the metal of the anode therethrough but suppresses electron transport therethrough. The ALD protection layer may also be effective to inhibit passage of air and/or water therethrough. The ALD protection layer can allow more relaxed purity requirements for subsequent battery assembly, electrolyte specifications, and/or cathode gas purity. Fabrication methods for the protection layers, protected metal anodes, and systems and devices incorporating such protected metal anodes are also disclosed herein.
    Type: Application
    Filed: October 5, 2015
    Publication date: September 14, 2017
    Inventors: Alexander C. KOZEN, Marshall A. SCHROEDER, Gary W. RUBLOFF, Liangbing HU, Malakhi NOKED, Sang Bok LEE